Large-scale nanopatterning of metal surfaces by target-ion induced plasma sputtering (TIPS)

Tae Sik Jang, Sungwon Kim, Hyun Do Jung, Jin Wook Chung, Hyoun Ee Kim, Young-Hag Koh, Juha Song

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Target-ion induced plasma sputtering (TIPS) is a one-step self-organization nanofabrication method in which a conventional DC magnetron sputter with a negative substrate bias voltage is used. This process successfully leads to ion-induced sputtering on metal substrates, producing large-scale nanopatterns on various metal surfaces. We demonstrated that the obtained nanopatterns have size-tunability from nano- to micro-scales by modulating the negative substrate voltage. This large-scale, bottom-up nanofabrication technique will accelerate nanopattern applications in biomedical, chemical or magnetic devices through large surface-to-volume ratios and unique surface topography of induced ripple patterns on metals.

Original languageEnglish
Pages (from-to)23702-23708
Number of pages7
JournalRSC Advances
Volume6
Issue number28
DOIs
Publication statusPublished - 2016

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

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    Jang, T. S., Kim, S., Jung, H. D., Chung, J. W., Kim, H. E., Koh, Y-H., & Song, J. (2016). Large-scale nanopatterning of metal surfaces by target-ion induced plasma sputtering (TIPS). RSC Advances, 6(28), 23702-23708. https://doi.org/10.1039/c6ra00443a