Large-size printed broadband membrane reflectors by laser interference lithography

Jung Hun Seo, Jungho Park, Deyin Zhao, Tea Yeon Oh, Hongjun Yang, Weidong Zhou, Byeongkwon Ju, Zhenqiang Ma

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Large-area broadband reflectors based on photonic crystals can enable a number of optoelectronic and photonics devices. To create nano-scale patterns, electron-beam lithography and focused ion beam patterning techniques are commonly used. However, these methods are very slow and hard to form very large area patterns. Laser Interference Lithography (LIL), on the other hand, can be used to easily generate nano patterns with perfect ordering. LIL is maskless, fast and can generate large area nano pattern at low cost. In this study, two-dimensional photonic crystal slab structures were formed by the LIL patterning technique and reactive ion etching (RIE) process on silicon-on-insulator (SOI) wafer. Top patterned Si nanomembrane layer was then released from the SOI substrate by selectively etching away the buried oxide layer. This top Si membrane reflector (MR) was then picked up and printed onto glass substrate by employing an elastic stamp transfer printing technique.. High reflectivity broadband reflection reflectors on glass were obtained, with measured reflectivity of 92% around 1200 nm. Large area uniform patterns were verified experimentally with measured reflectivity from multiple measurement locations. The work can lead to high performance membrane reflector manufacturing based on very simple and cost-effective approach. The devices to be enable by the LIL patterning techniques shall have significant impact on future optoelectronic and photonic applications.

Original languageEnglish
Title of host publicationNanotechnology 2012
Subtitle of host publicationElectronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
Pages23-26
Number of pages4
Publication statusPublished - 2012
EventNanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 - Santa Clara, CA, United States
Duration: 2012 Jun 182012 Jun 21

Publication series

NameTechnical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012

Other

OtherNanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012
CountryUnited States
CitySanta Clara, CA
Period12/6/1812/6/21

Keywords

  • Broadband membrane reflectors
  • Laser interference lithography
  • Silicon nanomembrane
  • Transfer printing

ASJC Scopus subject areas

  • Ceramics and Composites
  • Surfaces, Coatings and Films

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  • Cite this

    Seo, J. H., Park, J., Zhao, D., Oh, T. Y., Yang, H., Zhou, W., Ju, B., & Ma, Z. (2012). Large-size printed broadband membrane reflectors by laser interference lithography. In Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational - 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012 (pp. 23-26). (Technical Proceedings of the 2012 NSTI Nanotechnology Conference and Expo, NSTI-Nanotech 2012).