Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride)

Sang Yun Lee, Bo Hyun Kim, Soung Kyu Park, Jinsoo Joo, Yowng Whoan Beag, Seok Keun Koh

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

Poly (vinylidene fluoride) (PVDF) samples were implanted by using high energy (MeV) F2+ and Cl2+ ions. We observed that AC dielectric constant of the ion-implanted PVDF samples decreased from 10.5 to 2.5 at 1 kHz as the ion dosage increased from 1011 to 3 × 1014 ions/cm2. From differential scanning calorimetry experiments, we observed that PVDF samples become more disordered state through the ion implantation. The decrease of the number of bonding of C-H and C-F and the increase of unsaturated bonding were observed from X-ray photoelectron spectroscopy experiments. The emission of HF and H2 molecules during the ion implantation was detected by residual gas analyzer spectrum. Based upon the results, we analyzed that the low AC dielectric constant of the MeV ion-implanted PVDF samples originated from the reduction of polarization due to the structural change of the CF2 molecules in the MeV ion-implanted PVDF samples.

Original languageEnglish
Pages (from-to)9-13
Number of pages5
JournalMacromolecular Research
Volume11
Issue number1
Publication statusPublished - 2003 Feb 1

Fingerprint

Permittivity
Ions
Ion implantation
Spectrum analyzers
Molecules
polyvinylidene fluoride
Differential scanning calorimetry
X ray photoelectron spectroscopy
Gases
Experiments
Polarization

Keywords

  • AC dielectric constant
  • Interlayer dielectric
  • Ion implantation
  • Poly(vinylidene fluoride)

ASJC Scopus subject areas

  • Polymers and Plastics
  • Materials Chemistry

Cite this

Lee, S. Y., Kim, B. H., Park, S. K., Joo, J., Beag, Y. W., & Koh, S. K. (2003). Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride). Macromolecular Research, 11(1), 9-13.

Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride). / Lee, Sang Yun; Kim, Bo Hyun; Park, Soung Kyu; Joo, Jinsoo; Beag, Yowng Whoan; Koh, Seok Keun.

In: Macromolecular Research, Vol. 11, No. 1, 01.02.2003, p. 9-13.

Research output: Contribution to journalArticle

Lee, SY, Kim, BH, Park, SK, Joo, J, Beag, YW & Koh, SK 2003, 'Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride)', Macromolecular Research, vol. 11, no. 1, pp. 9-13.
Lee SY, Kim BH, Park SK, Joo J, Beag YW, Koh SK. Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride). Macromolecular Research. 2003 Feb 1;11(1):9-13.
Lee, Sang Yun ; Kim, Bo Hyun ; Park, Soung Kyu ; Joo, Jinsoo ; Beag, Yowng Whoan ; Koh, Seok Keun. / Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride). In: Macromolecular Research. 2003 ; Vol. 11, No. 1. pp. 9-13.
@article{ea2941abac704d2995b3e16fe33f87d5,
title = "Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride)",
abstract = "Poly (vinylidene fluoride) (PVDF) samples were implanted by using high energy (MeV) F2+ and Cl2+ ions. We observed that AC dielectric constant of the ion-implanted PVDF samples decreased from 10.5 to 2.5 at 1 kHz as the ion dosage increased from 1011 to 3 × 1014 ions/cm2. From differential scanning calorimetry experiments, we observed that PVDF samples become more disordered state through the ion implantation. The decrease of the number of bonding of C-H and C-F and the increase of unsaturated bonding were observed from X-ray photoelectron spectroscopy experiments. The emission of HF and H2 molecules during the ion implantation was detected by residual gas analyzer spectrum. Based upon the results, we analyzed that the low AC dielectric constant of the MeV ion-implanted PVDF samples originated from the reduction of polarization due to the structural change of the CF2 molecules in the MeV ion-implanted PVDF samples.",
keywords = "AC dielectric constant, Interlayer dielectric, Ion implantation, Poly(vinylidene fluoride)",
author = "Lee, {Sang Yun} and Kim, {Bo Hyun} and Park, {Soung Kyu} and Jinsoo Joo and Beag, {Yowng Whoan} and Koh, {Seok Keun}",
year = "2003",
month = "2",
day = "1",
language = "English",
volume = "11",
pages = "9--13",
journal = "Macromolecular Research",
issn = "1598-5032",
publisher = "Polymer Society of Korea",
number = "1",

}

TY - JOUR

T1 - Low dielectric constant of MeV ion-implanted poly(vinylidene fluoride)

AU - Lee, Sang Yun

AU - Kim, Bo Hyun

AU - Park, Soung Kyu

AU - Joo, Jinsoo

AU - Beag, Yowng Whoan

AU - Koh, Seok Keun

PY - 2003/2/1

Y1 - 2003/2/1

N2 - Poly (vinylidene fluoride) (PVDF) samples were implanted by using high energy (MeV) F2+ and Cl2+ ions. We observed that AC dielectric constant of the ion-implanted PVDF samples decreased from 10.5 to 2.5 at 1 kHz as the ion dosage increased from 1011 to 3 × 1014 ions/cm2. From differential scanning calorimetry experiments, we observed that PVDF samples become more disordered state through the ion implantation. The decrease of the number of bonding of C-H and C-F and the increase of unsaturated bonding were observed from X-ray photoelectron spectroscopy experiments. The emission of HF and H2 molecules during the ion implantation was detected by residual gas analyzer spectrum. Based upon the results, we analyzed that the low AC dielectric constant of the MeV ion-implanted PVDF samples originated from the reduction of polarization due to the structural change of the CF2 molecules in the MeV ion-implanted PVDF samples.

AB - Poly (vinylidene fluoride) (PVDF) samples were implanted by using high energy (MeV) F2+ and Cl2+ ions. We observed that AC dielectric constant of the ion-implanted PVDF samples decreased from 10.5 to 2.5 at 1 kHz as the ion dosage increased from 1011 to 3 × 1014 ions/cm2. From differential scanning calorimetry experiments, we observed that PVDF samples become more disordered state through the ion implantation. The decrease of the number of bonding of C-H and C-F and the increase of unsaturated bonding were observed from X-ray photoelectron spectroscopy experiments. The emission of HF and H2 molecules during the ion implantation was detected by residual gas analyzer spectrum. Based upon the results, we analyzed that the low AC dielectric constant of the MeV ion-implanted PVDF samples originated from the reduction of polarization due to the structural change of the CF2 molecules in the MeV ion-implanted PVDF samples.

KW - AC dielectric constant

KW - Interlayer dielectric

KW - Ion implantation

KW - Poly(vinylidene fluoride)

UR - http://www.scopus.com/inward/record.url?scp=0038134985&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0038134985&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0038134985

VL - 11

SP - 9

EP - 13

JO - Macromolecular Research

JF - Macromolecular Research

SN - 1598-5032

IS - 1

ER -