Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and HighFK/Metal gate stack for Monolithic 3D integration

Jin Hong Park, Munehiro Tada, Duygu Kuzum, Pawan Kapur, Hyun Yong Yu, H. S.Philip Wong, Krishna C. Saraswat

Research output: Chapter in Book/Report/Conference proceedingConference contribution

38 Citations (Scopus)

Fingerprint Dive into the research topics of 'Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and HighFK/Metal gate stack for Monolithic 3D integration'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy