Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfaces

Gyeong Beom Lee, Kyung Sik Son, Suk Won Park, Joon Hyung Shim, Byoung-Ho Choi

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

In this study, a layer of Al2O3 was deposited on blown polyethylene films by atomic layer deposition (ALD) at low temperatures, and the surface characteristics of these Al2O3-coated blown polyethylene films were analyzed. In order to examine the effects of the plasma treatment of the surfaces of the blown polyethylene films on the properties of the films, both untreated and plasma-treated film samples were prepared under various processing conditions. The surface characteristics of the samples were determined by x-ray photoelectron spectroscopy, as well as by measuring their surface contact angles. It was confirmed that the surfaces of the plasma-treated samples contained a hydroxyl group, which helped the precursor and the polyethylene substrate to bind. ALD of Al2O 3 was performed through sequential exposures to trimethylaluminum and H2O at 60 °C. The surface morphologies of the Al 2O3-coated blown polyethylene films were observed using atomic force microscopy and scanning electron microscopy/energy-dispersive x-ray spectroscopy. Further, it was confirmed that after ALD, the surface of the plasma-treated film was covered with alumina grains more uniformly than was the case for the surface of the untreated polymer film. It was also confirmed via the focused ion beam technique that the layer Al2O3 conformed to the surface of the blown polyethylene film.

Original languageEnglish
Article number01A129
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume31
Issue number1
DOIs
Publication statusPublished - 2013 Jan 1

Fingerprint

Atomic layer deposition
Polyethylene
atomic layer epitaxy
Polyethylenes
polyethylenes
Plasmas
Temperature
x ray spectroscopy
X rays
Aluminum Oxide
Focused ion beams
Photoelectron spectroscopy
Polymer films
Hydroxyl Radical
Contact angle
Surface morphology
Atomic force microscopy
Alumina
Spectroscopy
aluminum oxides

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfaces. / Beom Lee, Gyeong; Sik Son, Kyung; Won Park, Suk; Shim, Joon Hyung; Choi, Byoung-Ho.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 31, No. 1, 01A129, 01.01.2013.

Research output: Contribution to journalArticle

@article{78883bfea7c3496b94d319441d28ac5b,
title = "Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfaces",
abstract = "In this study, a layer of Al2O3 was deposited on blown polyethylene films by atomic layer deposition (ALD) at low temperatures, and the surface characteristics of these Al2O3-coated blown polyethylene films were analyzed. In order to examine the effects of the plasma treatment of the surfaces of the blown polyethylene films on the properties of the films, both untreated and plasma-treated film samples were prepared under various processing conditions. The surface characteristics of the samples were determined by x-ray photoelectron spectroscopy, as well as by measuring their surface contact angles. It was confirmed that the surfaces of the plasma-treated samples contained a hydroxyl group, which helped the precursor and the polyethylene substrate to bind. ALD of Al2O 3 was performed through sequential exposures to trimethylaluminum and H2O at 60 °C. The surface morphologies of the Al 2O3-coated blown polyethylene films were observed using atomic force microscopy and scanning electron microscopy/energy-dispersive x-ray spectroscopy. Further, it was confirmed that after ALD, the surface of the plasma-treated film was covered with alumina grains more uniformly than was the case for the surface of the untreated polymer film. It was also confirmed via the focused ion beam technique that the layer Al2O3 conformed to the surface of the blown polyethylene film.",
author = "{Beom Lee}, Gyeong and {Sik Son}, Kyung and {Won Park}, Suk and Shim, {Joon Hyung} and Byoung-Ho Choi",
year = "2013",
month = "1",
day = "1",
doi = "10.1116/1.4768171",
language = "English",
volume = "31",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "1",

}

TY - JOUR

T1 - Low-temperature atomic layer deposition of Al2O3 on blown polyethylene films with plasma-treated surfaces

AU - Beom Lee, Gyeong

AU - Sik Son, Kyung

AU - Won Park, Suk

AU - Shim, Joon Hyung

AU - Choi, Byoung-Ho

PY - 2013/1/1

Y1 - 2013/1/1

N2 - In this study, a layer of Al2O3 was deposited on blown polyethylene films by atomic layer deposition (ALD) at low temperatures, and the surface characteristics of these Al2O3-coated blown polyethylene films were analyzed. In order to examine the effects of the plasma treatment of the surfaces of the blown polyethylene films on the properties of the films, both untreated and plasma-treated film samples were prepared under various processing conditions. The surface characteristics of the samples were determined by x-ray photoelectron spectroscopy, as well as by measuring their surface contact angles. It was confirmed that the surfaces of the plasma-treated samples contained a hydroxyl group, which helped the precursor and the polyethylene substrate to bind. ALD of Al2O 3 was performed through sequential exposures to trimethylaluminum and H2O at 60 °C. The surface morphologies of the Al 2O3-coated blown polyethylene films were observed using atomic force microscopy and scanning electron microscopy/energy-dispersive x-ray spectroscopy. Further, it was confirmed that after ALD, the surface of the plasma-treated film was covered with alumina grains more uniformly than was the case for the surface of the untreated polymer film. It was also confirmed via the focused ion beam technique that the layer Al2O3 conformed to the surface of the blown polyethylene film.

AB - In this study, a layer of Al2O3 was deposited on blown polyethylene films by atomic layer deposition (ALD) at low temperatures, and the surface characteristics of these Al2O3-coated blown polyethylene films were analyzed. In order to examine the effects of the plasma treatment of the surfaces of the blown polyethylene films on the properties of the films, both untreated and plasma-treated film samples were prepared under various processing conditions. The surface characteristics of the samples were determined by x-ray photoelectron spectroscopy, as well as by measuring their surface contact angles. It was confirmed that the surfaces of the plasma-treated samples contained a hydroxyl group, which helped the precursor and the polyethylene substrate to bind. ALD of Al2O 3 was performed through sequential exposures to trimethylaluminum and H2O at 60 °C. The surface morphologies of the Al 2O3-coated blown polyethylene films were observed using atomic force microscopy and scanning electron microscopy/energy-dispersive x-ray spectroscopy. Further, it was confirmed that after ALD, the surface of the plasma-treated film was covered with alumina grains more uniformly than was the case for the surface of the untreated polymer film. It was also confirmed via the focused ion beam technique that the layer Al2O3 conformed to the surface of the blown polyethylene film.

UR - http://www.scopus.com/inward/record.url?scp=84871884542&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84871884542&partnerID=8YFLogxK

U2 - 10.1116/1.4768171

DO - 10.1116/1.4768171

M3 - Article

AN - SCOPUS:84871884542

VL - 31

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 1

M1 - 01A129

ER -