Magnetic, microstructural, and compositional characterization of Fe-N thin films for recording sensor applications

Young-geun Kim, P. B. Narayan

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The dependence of microstructural characteristics and magnetic properties on the processing conditions of reactively dc magnetron sputter-deposited Fe-N films (≤1000 Å) was investigated for advanced recording sensor applications. The N content of the film increases linearly as the ratio of N 2 to Ar flow rate increases. Magnetic properties could be significantly modified by the incorporation of N into the Fe matrix. A N-content range was discovered where desirable soft magnetic properties such as low coercivity and low magnetostriction could be achieved. The soft magnetic properties originated from the amorphous microstructure as evidenced by transmission electron microscopy and x-ray diffraction. The electrical resistivity of Fe-N films with soft magnetic properties was an order of magnitude higher than that of pure Fe or NiFe thin films with comparable thickness.

Original languageEnglish
Pages (from-to)1040-1043
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume13
Issue number3
DOIs
Publication statusPublished - 1995 Dec 1
Externally publishedYes

Fingerprint

Magnetic properties
recording
magnetic properties
Thin films
sensors
Sensors
thin films
Magnetostriction
magnetostriction
Coercive force
coercivity
x ray diffraction
flow velocity
Diffraction
Flow rate
Transmission electron microscopy
X rays
transmission electron microscopy
microstructure
Microstructure

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

@article{5bd5e363e9a240c4ac25e231214741c3,
title = "Magnetic, microstructural, and compositional characterization of Fe-N thin films for recording sensor applications",
abstract = "The dependence of microstructural characteristics and magnetic properties on the processing conditions of reactively dc magnetron sputter-deposited Fe-N films (≤1000 {\AA}) was investigated for advanced recording sensor applications. The N content of the film increases linearly as the ratio of N 2 to Ar flow rate increases. Magnetic properties could be significantly modified by the incorporation of N into the Fe matrix. A N-content range was discovered where desirable soft magnetic properties such as low coercivity and low magnetostriction could be achieved. The soft magnetic properties originated from the amorphous microstructure as evidenced by transmission electron microscopy and x-ray diffraction. The electrical resistivity of Fe-N films with soft magnetic properties was an order of magnitude higher than that of pure Fe or NiFe thin films with comparable thickness.",
author = "Young-geun Kim and Narayan, {P. B.}",
year = "1995",
month = "12",
day = "1",
doi = "10.1116/1.579581",
language = "English",
volume = "13",
pages = "1040--1043",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "3",

}

TY - JOUR

T1 - Magnetic, microstructural, and compositional characterization of Fe-N thin films for recording sensor applications

AU - Kim, Young-geun

AU - Narayan, P. B.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - The dependence of microstructural characteristics and magnetic properties on the processing conditions of reactively dc magnetron sputter-deposited Fe-N films (≤1000 Å) was investigated for advanced recording sensor applications. The N content of the film increases linearly as the ratio of N 2 to Ar flow rate increases. Magnetic properties could be significantly modified by the incorporation of N into the Fe matrix. A N-content range was discovered where desirable soft magnetic properties such as low coercivity and low magnetostriction could be achieved. The soft magnetic properties originated from the amorphous microstructure as evidenced by transmission electron microscopy and x-ray diffraction. The electrical resistivity of Fe-N films with soft magnetic properties was an order of magnitude higher than that of pure Fe or NiFe thin films with comparable thickness.

AB - The dependence of microstructural characteristics and magnetic properties on the processing conditions of reactively dc magnetron sputter-deposited Fe-N films (≤1000 Å) was investigated for advanced recording sensor applications. The N content of the film increases linearly as the ratio of N 2 to Ar flow rate increases. Magnetic properties could be significantly modified by the incorporation of N into the Fe matrix. A N-content range was discovered where desirable soft magnetic properties such as low coercivity and low magnetostriction could be achieved. The soft magnetic properties originated from the amorphous microstructure as evidenced by transmission electron microscopy and x-ray diffraction. The electrical resistivity of Fe-N films with soft magnetic properties was an order of magnitude higher than that of pure Fe or NiFe thin films with comparable thickness.

UR - http://www.scopus.com/inward/record.url?scp=65949107048&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=65949107048&partnerID=8YFLogxK

U2 - 10.1116/1.579581

DO - 10.1116/1.579581

M3 - Article

VL - 13

SP - 1040

EP - 1043

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 3

ER -