Magnetic properties of TbFe thin films under applied stress

M. Pasquale, A. Infortuna, L. Martino, C. Sasso, C. Beatrice, Sang Ho Lim

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at % is determined for sensor applications requiring magnetic softness and stress sensitivity.

Original languageEnglish
Pages (from-to)769-771
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume215
DOIs
Publication statusPublished - 2000 Jun 2
Externally publishedYes

Fingerprint

Magnetic properties
magnetic properties
Thin films
Anisotropy
thin films
Magnetooptical effects
anisotropy
softness
magneto-optics
Kerr effects
Chemical analysis
Thick films
Magnetron sputtering
thick films
magnetron sputtering
atmospheres
sensitivity
sensors
Sensors
Substrates

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Magnetic properties of TbFe thin films under applied stress. / Pasquale, M.; Infortuna, A.; Martino, L.; Sasso, C.; Beatrice, C.; Lim, Sang Ho.

In: Journal of Magnetism and Magnetic Materials, Vol. 215, 02.06.2000, p. 769-771.

Research output: Contribution to journalArticle

Pasquale, M. ; Infortuna, A. ; Martino, L. ; Sasso, C. ; Beatrice, C. ; Lim, Sang Ho. / Magnetic properties of TbFe thin films under applied stress. In: Journal of Magnetism and Magnetic Materials. 2000 ; Vol. 215. pp. 769-771.
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