Magnetic properties of TbFe thin films under applied stress

M. Pasquale, A. Infortuna, L. Martino, C. Sasso, C. Beatrice, S. H. Lim

Research output: Contribution to journalConference article

8 Citations (Scopus)

Abstract

The magnetic properties of a set of TbxFe1-x magnetostrictive thin films are measured under applied stress in a cantilever configuration. The 1 μm thick films are produced on 200 μm thick Si (1 0 0) substrates by magnetron sputtering in Ar atmosphere. Magnetic characterization is obtained with complementary fluxmetric and magneto-optic Kerr effect methods. The role of stress-induced anisotropy is discussed, with reference to the intrinsic anisotropy which can lie in-plane or out-of-plane depending on composition. An optimal film composition at x = 54 at % is determined for sensor applications requiring magnetic softness and stress sensitivity.

Original languageEnglish
Pages (from-to)769-771
Number of pages3
JournalJournal of Magnetism and Magnetic Materials
Volume215
DOIs
Publication statusPublished - 2000 Jun 2
Externally publishedYes
Event14th International Symposium on Soft Magnetic Materials (SMM14) - Balatonfured, Hung
Duration: 1999 Sep 81999 Sep 10

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Magnetic properties of TbFe thin films under applied stress'. Together they form a unique fingerprint.

  • Cite this