Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.
|Journal||Digests of the Intermag Conference|
|Publication status||Published - 2003|
|Event||Intermag 2003: International Magnetics Conference - Boston, MA, United States|
Duration: 2003 Mar 28 → 2003 Apr 3
ASJC Scopus subject areas
- Electrical and Electronic Engineering