Magnetization reversal under non-uniform magnetic fields

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.

Original languageEnglish
Title of host publicationDigests of the Intermag Conference
Publication statusPublished - 2003
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: 2003 Mar 282003 Apr 3

Other

OtherIntermag 2003: International Magnetics Conference
CountryUnited States
CityBoston, MA
Period03/3/2803/4/3

Fingerprint

Magnetization reversal
Magnetic fields
Magnetic thin films

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

Cite this

Kim, K. S., Lee, C. E., & Lim, S. H. (2003). Magnetization reversal under non-uniform magnetic fields. In Digests of the Intermag Conference

Magnetization reversal under non-uniform magnetic fields. / Kim, K. S.; Lee, Cheol Eui; Lim, Sang Ho.

Digests of the Intermag Conference. 2003.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kim, KS, Lee, CE & Lim, SH 2003, Magnetization reversal under non-uniform magnetic fields. in Digests of the Intermag Conference. Intermag 2003: International Magnetics Conference, Boston, MA, United States, 03/3/28.
Kim KS, Lee CE, Lim SH. Magnetization reversal under non-uniform magnetic fields. In Digests of the Intermag Conference. 2003
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