Abstract
Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.
| Original language | English |
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| Pages (from-to) | DP04 |
| Journal | Digests of the Intermag Conference |
| Publication status | Published - 2003 |
| Event | Intermag 2003: International Magnetics Conference - Boston, MA, United States Duration: 2003 Mar 28 → 2003 Apr 3 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering