Magnetization reversal under non-uniform magnetic fields

K. S. Kim, C. E. Lee, S. H. Lim

Research output: Contribution to journalConference article

Abstract

Magnetization reversal under non-uniform magnetic fields was discussed. The micromagnetic simulation was carried out for a magnetic thin film with the dimensions of 0.8 μm × 0.4 μm ×0.008 μm. The main reason for the observed magnetization reversal behavior depending on the non-uniformity of applied field is that the 'edge effect' is smaller when the non-uniformity of the applied field is greater.

Original languageEnglish
Pages (from-to)DP04
JournalDigests of the Intermag Conference
Publication statusPublished - 2003 Oct 1
EventIntermag 2003: International Magnetics Conference - Boston, MA, United States
Duration: 2003 Mar 282003 Apr 3

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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