Maskless optical microscope lithography system

Eung Seok Park, Doyoung Jang, Jaewoo Lee, Yun Jeong Kim, Junhong Na, Hyunjin Ji, Jae Wan Choi, Gyu-Tae Kim

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.

Original languageEnglish
Article number126101
JournalReview of Scientific Instruments
Volume80
Issue number12
DOIs
Publication statusPublished - 2009 Dec 1

Fingerprint

optical microscopes
Lithography
Microscopes
lithography
microbalances
Photolithography
Nanowires
Masks
photolithography
nanowires
Substrates
masks
microscopes
shift

ASJC Scopus subject areas

  • Instrumentation

Cite this

Park, E. S., Jang, D., Lee, J., Kim, Y. J., Na, J., Ji, H., ... Kim, G-T. (2009). Maskless optical microscope lithography system. Review of Scientific Instruments, 80(12), [126101]. https://doi.org/10.1063/1.3266965

Maskless optical microscope lithography system. / Park, Eung Seok; Jang, Doyoung; Lee, Jaewoo; Kim, Yun Jeong; Na, Junhong; Ji, Hyunjin; Choi, Jae Wan; Kim, Gyu-Tae.

In: Review of Scientific Instruments, Vol. 80, No. 12, 126101, 01.12.2009.

Research output: Contribution to journalArticle

Park, ES, Jang, D, Lee, J, Kim, YJ, Na, J, Ji, H, Choi, JW & Kim, G-T 2009, 'Maskless optical microscope lithography system', Review of Scientific Instruments, vol. 80, no. 12, 126101. https://doi.org/10.1063/1.3266965
Park ES, Jang D, Lee J, Kim YJ, Na J, Ji H et al. Maskless optical microscope lithography system. Review of Scientific Instruments. 2009 Dec 1;80(12). 126101. https://doi.org/10.1063/1.3266965
Park, Eung Seok ; Jang, Doyoung ; Lee, Jaewoo ; Kim, Yun Jeong ; Na, Junhong ; Ji, Hyunjin ; Choi, Jae Wan ; Kim, Gyu-Tae. / Maskless optical microscope lithography system. In: Review of Scientific Instruments. 2009 ; Vol. 80, No. 12.
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