Maskless optical microscope lithography system

Eung Seok Park, Doyoung Jang, Jaewoo Lee, Yun Jeong Kim, Junhong Na, Hyunjin Ji, Jae Wan Choi, Gyu Tae Kim

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

A simple maskless photolithography system employing an optical microscope, a motorized stage and a beam blanker is proposed. Based on a pattern design, the motorized stage shifts a resist-coated substrate exposed by a focused beam under a microscope. Microscale patterns are easily defined on a single nanowire without using a mask validating the application applying to the research requiring frequent changes or free-style designs in microscale test patterns.

Original languageEnglish
Article number126101
JournalReview of Scientific Instruments
Volume80
Issue number12
DOIs
Publication statusPublished - 2009

ASJC Scopus subject areas

  • Instrumentation

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