Material characteristics of metalorganic chemical vapor deposition of Bi₂Te₃ films on GaAs substrates

Engineering & Materials Science

• Metallorganic chemical vapor deposition 100%
• Surface morphology 71%
• Carrier concentration 44%
• Substrates 44%
• Hall mobility 31%
• Temperature 25%
• Seebeck coefficient 25%
• Organic chemicals 24%
• Metals 20%
• Chemical vapor deposition 18%
• Coalescence 18%
• Electric properties 16%
• Thin films 14%

Chemical Compounds

• Chemical Vapour Deposition 57%
• Thermoelectricity 35%
• Liquid Film 30%
• Surface 20%
• Seebeck Coefficient 20%
• Coalescence 17%
• Electrical Property 13%
• Compound Mobility 12%
• Application 4%

Physics & Astronomy

• metalorganic chemical vapor deposition 60%
• Seebeck effect 16%
• coalescing 15%
• temperature 14%
• electrical properties 11%
• thin films 8%
• metals 8%