Memory characteristics of Al nanocrystals embedded in Al2O3 layers

Byoungjun Park, Kyoungah Cho, Byung-Moo Moon, Sangsig Kim

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

The capacitance characteristics of aluminum nanocrystal-embedded metal-oxide-semiconductor (MOS) capacitors with gate layers composed of Al2O3 layers are investigated in this work. The capacitance versus voltage (C-V) curves obtained from a representative MOS capacitor embedded with aluminum nanocrystals synthesized by the thermal treatment process exhibit the window of flat-band voltage shift, which indicates the presence of charge storages in the aluminum nanocrystals. Their hysteresis curves are dependent on the range of sweep voltage. The counterclockwise hysteresis and leftward shift of the flat-band voltages observed from the C-V curves signify that electrons are trapped in a floating gate layer consisting of the aluminum nanocrystals present between two Al2O3 layers in the MOS capacitor, and that these trapped electrons originate from the p-type Si substrate.

Original languageEnglish
Pages (from-to)1627-1630
Number of pages4
JournalMicroelectronic Engineering
Volume84
Issue number5-8
DOIs
Publication statusPublished - 2007 May 1

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Keywords

  • AlO
  • Aluminum
  • High-k
  • Memory
  • Nanocrystal

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

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