Abstract
We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.
| Original language | English |
|---|---|
| Pages (from-to) | 1028-1032 |
| Number of pages | 5 |
| Journal | Nanoscience and Nanotechnology Letters |
| Volume | 9 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 2017 Jul 1 |
Keywords
- Laser Interference Lithography (LIL)
- Micro/Nano Stripe Organic Light Emitting Diodes
- Pixel Defining Layer (PDL)
ASJC Scopus subject areas
- Materials Science(all)
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Cite this
You, B., Joo, C. W., Ha, H. J., Lee, J. I., Lee, J., & Ju, B. K. (2017). Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography. Nanoscience and Nanotechnology Letters, 9(7), 1028-1032. https://doi.org/10.1166/nnl.2017.2432