Abstract
We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.
| Original language | English |
|---|---|
| Pages (from-to) | 1028-1032 |
| Number of pages | 5 |
| Journal | Nanoscience and Nanotechnology Letters |
| Volume | 9 |
| Issue number | 7 |
| DOIs | |
| Publication status | Published - 2017 Jul 1 |
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Keywords
- Laser Interference Lithography (LIL)
- Micro/Nano Stripe Organic Light Emitting Diodes
- Pixel Defining Layer (PDL)
ASJC Scopus subject areas
- Materials Science(all)
Cite this
Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography. / You, Banseok; Joo, Chul Woong; Ha, Hyeon Jun; Lee, Jeong Ik; Lee, Jonghee; Ju, Byeong Kwon.
In: Nanoscience and Nanotechnology Letters, Vol. 9, No. 7, 01.07.2017, p. 1028-1032.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography
AU - You, Banseok
AU - Joo, Chul Woong
AU - Ha, Hyeon Jun
AU - Lee, Jeong Ik
AU - Lee, Jonghee
AU - Ju, Byeong Kwon
PY - 2017/7/1
Y1 - 2017/7/1
N2 - We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.
AB - We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.
KW - Laser Interference Lithography (LIL)
KW - Micro/Nano Stripe Organic Light Emitting Diodes
KW - Pixel Defining Layer (PDL)
UR - http://www.scopus.com/inward/record.url?scp=85028005963&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85028005963&partnerID=8YFLogxK
U2 - 10.1166/nnl.2017.2432
DO - 10.1166/nnl.2017.2432
M3 - Article
AN - SCOPUS:85028005963
VL - 9
SP - 1028
EP - 1032
JO - Nanoscience and Nanotechnology Letters
JF - Nanoscience and Nanotechnology Letters
SN - 1941-4900
IS - 7
ER -