Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography

Banseok You; Chul Woong Joo; Hyeon Jun Ha; Jeong Ik Lee; Jonghee Lee; Byeong Kwon Ju

doi:10.1166/nnl.2017.2432

Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography

Banseok You, Chul Woong Joo, Hyeon Jun Ha, Jeong Ik Lee, Jonghee Lee, Byeong Kwon Ju

School of Electrical Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.

Original language	English
Pages (from-to)	1028-1032
Number of pages	5
Journal	Nanoscience and Nanotechnology Letters
Volume	9
Issue number	7
DOIs	https://doi.org/10.1166/nnl.2017.2432
Publication status	Published - 2017 Jul

Keywords

Laser Interference Lithography (LIL)
Micro/Nano Stripe Organic Light Emitting Diodes
Pixel Defining Layer (PDL)

ASJC Scopus subject areas

Materials Science(all)

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10.1166/nnl.2017.2432

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@article{dbba56a5a3104563be9b3446432bc207,

title = "Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography",

abstract = "We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.",

keywords = "Laser Interference Lithography (LIL), Micro/Nano Stripe Organic Light Emitting Diodes, Pixel Defining Layer (PDL)",

author = "Banseok You and Joo, {Chul Woong} and Ha, {Hyeon Jun} and Lee, {Jeong Ik} and Jonghee Lee and Ju, {Byeong Kwon}",

note = "Funding Information: Acknowledgments: This work was supported by the Industrial Strategic Technology Development Program [10045269, Development of Soluble TFT and Pixel Formation Materials/Process Technologies for AMOLED TV] funded by MOTIE/KEIT. This work was also supported by the Brain Korea 21 Plus Project in 2016. Publisher Copyright: Copyright {\textcopyright} 2017 American Scientific Publishers All rights reserved.",

year = "2017",

month = jul,

doi = "10.1166/nnl.2017.2432",

language = "English",

volume = "9",

pages = "1028--1032",

journal = "Nanoscience and Nanotechnology Letters",

issn = "1941-4900",

publisher = "American Scientific Publishers",

number = "7",

}

TY - JOUR

T1 - Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography

AU - You, Banseok

AU - Joo, Chul Woong

AU - Ha, Hyeon Jun

AU - Lee, Jeong Ik

AU - Lee, Jonghee

AU - Ju, Byeong Kwon

N1 - Funding Information: Acknowledgments: This work was supported by the Industrial Strategic Technology Development Program [10045269, Development of Soluble TFT and Pixel Formation Materials/Process Technologies for AMOLED TV] funded by MOTIE/KEIT. This work was also supported by the Brain Korea 21 Plus Project in 2016. Publisher Copyright: Copyright © 2017 American Scientific Publishers All rights reserved.

PY - 2017/7

Y1 - 2017/7

N2 - We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.

AB - We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.

KW - Laser Interference Lithography (LIL)

KW - Micro/Nano Stripe Organic Light Emitting Diodes

KW - Pixel Defining Layer (PDL)

UR - http://www.scopus.com/inward/record.url?scp=85028005963&partnerID=8YFLogxK

U2 - 10.1166/nnl.2017.2432

DO - 10.1166/nnl.2017.2432

M3 - Article

AN - SCOPUS:85028005963

VL - 9

SP - 1028

EP - 1032

JO - Nanoscience and Nanotechnology Letters

JF - Nanoscience and Nanotechnology Letters

SN - 1941-4900

IS - 7

ER -

Micro/nano-stripe organic light emitting diodes fabricated using photolithography and laser interference lithography

Abstract

Keywords

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