We have demonstrated the fabrication of OLEDs with a micro/nano-patterned pixel defining layer (PDL) using photolithography and laser interference lithography (LIL) techniques. Moreover, we have demonstrated the successful fabrication and operation of micro/nano-stripe OLED pixel sizes of 354 nm and 30 μm. This novel patterning technique scheme holds many merits such as reduced processing, cost, and limitations of resolution, and it is applicable to the fabrication of large-area displays. We discuss the micro/nano-stripe patterning method and device fabrication and analyze the optical and electrical characteristics of micro/nano-stripe OLEDs.
- Laser Interference Lithography (LIL)
- Micro/Nano Stripe Organic Light Emitting Diodes
- Pixel Defining Layer (PDL)
ASJC Scopus subject areas
- Materials Science(all)