Micropatterns of hierarchical self-assembled block copolymer droplets with solvent-assisted wetting of brush monolayers

Tae Hee Kim, June Huh, Cheolmin Park

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We present a method to fabricate micropatterns of a self-assembled block copolymer droplets with hierarchically ordered nanostructures by controlling solvent-assisted wetting of the droplets. This method is based on transfer-printing the micropatterned dewetted droplets formed onto a topographic poly(dimethylsiloxane) prepattern to a silicon wafer, followed by wetting triggered by solvent annealing. Solvent vapor provides sufficient mobility of block copolymer molecules in convex-shaped micropatterns and allows for controlling the 2D circular spread of the ∼7 nm thick brush monolayer, resulting in a novel structure hierarchically terraced with ordered spherical microdomains in the individual block copolymer droplets. Our micropatterning technique capable of controlling both shape and microstructure of individual droplets also enables us to produce a novel polarity tunable surface since contact angle of a water droplet is easily tailored as a function of solvent annealing time on micropatterns.

Original languageEnglish
Pages (from-to)5352-5357
Number of pages6
JournalMacromolecules
Volume43
Issue number12
DOIs
Publication statusPublished - 2010 Jun 22
Externally publishedYes

Fingerprint

Brushes
Block copolymers
Wetting
Monolayers
Annealing
Polydimethylsiloxane
Silicon wafers
Contact angle
Printing
Nanostructures
Vapors
Microstructure
Molecules
Water

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

Cite this

Micropatterns of hierarchical self-assembled block copolymer droplets with solvent-assisted wetting of brush monolayers. / Kim, Tae Hee; Huh, June; Park, Cheolmin.

In: Macromolecules, Vol. 43, No. 12, 22.06.2010, p. 5352-5357.

Research output: Contribution to journalArticle

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