Microstructural and electrochemical properties of Ti-doped Al 2O3 coated LiCoO2 films

Ji Ae Choi, Seong Rae Lee, Won Il Cho, Byung Won Cho

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We studied the microstructural and electrochemical properties of Ti-doped Al2O3 (Ti-Al2O3) coated LiCoO 2 thin films depending on the Ti composition. The 1.27 at.% Ti-Al2O3 coated films had an amorphous structure with better conductivity than that of pure Al2O3 films. The Ti-Al2O3 coating layer effectively suppressed the dissolution of Co and the formation of lower Li conductivity SEI films at the interface between the LiCoO2 film and electrolyte. The Ti-Al 2O3 coating improved the cycling performance and capacity retention at high voltage (4.5 V) of the LiCoO2 films. The Ti-Al 2O3 coated LiCoO2 films showed better electrochemical properties than did the pure Al2O3 coated LiCoO2 films. These results were closely related to the enhanced Li-conductivity and interfacial quality of the Ti-Al2O3 film.

Original languageEnglish
Pages (from-to)649-654
Number of pages6
JournalMetals and Materials International
Volume17
Issue number4
DOIs
Publication statusPublished - 2011 Aug

Keywords

  • LiCoO
  • TiAlO coating
  • electrochemistry
  • encrgy storage materials
  • sputtering

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Mechanics of Materials
  • Metals and Alloys
  • Materials Chemistry

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