Microstructural evolution and electrical resistivity of nanocrystalline W thin films grown by sputtering

Yong Jin Kim, Sung Gyu Kang, Yeonju Oh, Gyu Won Kim, In Ho Cha, Heung Nam Han, Young Keun Kim

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Tungsten (W) thin films and nanostructures, particularly those having a beta (β)-phase, have attracted a large amount of attention lately because an ultrathin β-phase W film attached to a ferromagnetic layer can reverse the direction of magnetization upon current injection. However, in-depth microstructural studies including the phase transformation in W films as a function of thickness and post-deposition heat treatment temperature are rare. Here, we report the microstructural evolution and the change in the electrical resistivity of W films with thicknesses of 5–40 nm. Microstructural analyses indicate that the β-W is nanocrystalline with a small grain size of about 5 nm, while the alpha (α)-W has a grain size larger than 130 nm with random crystal orientation. We present a state diagram showing the phase of the W film as functions of film thickness and annealing temperature.

Original languageEnglish
Pages (from-to)473-478
Number of pages6
JournalMaterials Characterization
Volume145
DOIs
Publication statusPublished - 2018 Nov 1

Fingerprint

Microstructural evolution
Sputtering
sputtering
Thin films
electrical resistivity
thin films
grain size
Tungsten
Crystal orientation
phase transformations
Film thickness
Nanostructures
Magnetization
tungsten
heat treatment
film thickness
Phase transitions
diagrams
Heat treatment
Annealing

Keywords

  • Electrical resistivity
  • Microstructure
  • Phase
  • TEM ASTAR
  • Thin film
  • Tungsten (W)

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Microstructural evolution and electrical resistivity of nanocrystalline W thin films grown by sputtering. / Kim, Yong Jin; Kang, Sung Gyu; Oh, Yeonju; Kim, Gyu Won; Cha, In Ho; Han, Heung Nam; Kim, Young Keun.

In: Materials Characterization, Vol. 145, 01.11.2018, p. 473-478.

Research output: Contribution to journalArticle

Kim, Yong Jin ; Kang, Sung Gyu ; Oh, Yeonju ; Kim, Gyu Won ; Cha, In Ho ; Han, Heung Nam ; Kim, Young Keun. / Microstructural evolution and electrical resistivity of nanocrystalline W thin films grown by sputtering. In: Materials Characterization. 2018 ; Vol. 145. pp. 473-478.
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