Abstract
Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/ CoFe/PtMn/Ta samples having different PtMn thickness (10-30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused, to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating ΔR/R. This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
Original language | English |
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Pages (from-to) | 2070-2072 |
Number of pages | 3 |
Journal | Journal of Magnetism and Magnetic Materials |
Volume | 226-230 |
Issue number | PART II |
DOIs | |
Publication status | Published - 2001 |
Keywords
- Annealing
- Giant magnetoresistance
- Microstructure
- Spin value
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics