Abstract
Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/ CoFe/PtMn/Ta samples having different PtMn thickness (10-30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused, to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating ΔR/R. This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
| Original language | English |
|---|---|
| Pages (from-to) | 2070-2072 |
| Number of pages | 3 |
| Journal | Journal of Magnetism and Magnetic Materials |
| Volume | 226-230 |
| Issue number | PART II |
| Publication status | Published - 2001 Dec 1 |
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Keywords
- Annealing
- Giant magnetoresistance
- Microstructure
- Spin value
ASJC Scopus subject areas
- Condensed Matter Physics
- Electronic, Optical and Magnetic Materials
Cite this
Microstructural evolution in PtMn-based spin-valves induced by heat treatment. / Yang, Hyuck Soo; Min, K. I.; Kim, Young-geun; Lee, Seong Rae; Park, Gyeong Su; Song, Se Ahn.
In: Journal of Magnetism and Magnetic Materials, Vol. 226-230, No. PART II, 01.12.2001, p. 2070-2072.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Microstructural evolution in PtMn-based spin-valves induced by heat treatment
AU - Yang, Hyuck Soo
AU - Min, K. I.
AU - Kim, Young-geun
AU - Lee, Seong Rae
AU - Park, Gyeong Su
AU - Song, Se Ahn
PY - 2001/12/1
Y1 - 2001/12/1
N2 - Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/ CoFe/PtMn/Ta samples having different PtMn thickness (10-30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused, to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating ΔR/R. This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
AB - Annealing time effect on the magnetotransport properties was investigated for Si/alumina/Ta/NiFe/CoFe/Cu/ CoFe/PtMn/Ta samples having different PtMn thickness (10-30 nm). Post-deposition heat treatment was performed using a vacuum furnace with 3 kOe field at 270°C up to 35 h. The thermally activated atoms diffused, to other layers through grain boundaries during the heat treatment with longer annealing hours resulting in deteriorating ΔR/R. This effect is more profound in films with thicker PtMn layers where interface became rougher after annealing.
KW - Annealing
KW - Giant magnetoresistance
KW - Microstructure
KW - Spin value
UR - http://www.scopus.com/inward/record.url?scp=33748678707&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=33748678707&partnerID=8YFLogxK
M3 - Article
VL - 226-230
SP - 2070
EP - 2072
JO - Journal of Magnetism and Magnetic Materials
JF - Journal of Magnetism and Magnetic Materials
SN - 0304-8853
IS - PART II
ER -