The operation of a generic single-layer MoS 2 photoelectronic memory device that fully utilized the exotic electrical and optical properties of single-layer MoS 2 . A single-layer MoS 2 flake with a direct band gap of 1.8 eV acted as both a channel material and a light-absorption layer, and AuNPs were employed as the charge-trapping layers to achieve high-performance memory operation. Photoillumination excited the electrons in the MoS 2 layer valence band into the conduction band. Before the photoinduced excitons had recombined, the application of a negative gate voltage induced charge transfer from the AuNPs to the MoS 2 valance band. The transferred electrons prohibited recombination among the photoexcited electrons, which enabled the persistent storage of photonic signals. The transferred electrons prohibited recombination among the photoexcited electrons, which enabled the persistent storage of photonic signals. The multilevel data storage could be deterministically reconfigured by both the applied gate voltage and the illumination power. The resulting MoS 2 photoelectronic memories exhibited excellent memory characteristics, including a large programming/erasing current ratio, multilevel data storage, cyclic endurance, and stable retention.
- memory devices, floating gates
- multilevel programs
- nonvolatile photoelectronic memory
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering