Multifunctional particle coating by plasma process and its application to pollution control

Anna Nasonova, Kyo Seon Kim

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Multifunctional particle coating by Plasma-Enhanced Chemical Vapor Deposition (PECVD) and its application are presented in this review. A rotating PECVD reactor can be used to prepare single-layer or multi-layer thin films on substrate particles of various materials with different shapes by using various gas/liquid precursors. The current development of the rotating PECVD process for particle coating of high quality is discussed, along with simulation and experimental results, in the present review. Flexibility in changing the process variables of rotating PECVD enables this process to be considered as a promising method for particle coating with possible applications in many different fields.

Original languageEnglish
Pages (from-to)29866-29875
Number of pages10
JournalRSC Advances
Volume4
Issue number56
DOIs
Publication statusPublished - 2014 Jan 1
Externally publishedYes

Fingerprint

Pollution control
Plasma enhanced chemical vapor deposition
Plasmas
Coatings
Gases
Thin films
Liquids
Substrates

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)

Cite this

Multifunctional particle coating by plasma process and its application to pollution control. / Nasonova, Anna; Kim, Kyo Seon.

In: RSC Advances, Vol. 4, No. 56, 01.01.2014, p. 29866-29875.

Research output: Contribution to journalArticle

Nasonova, Anna ; Kim, Kyo Seon. / Multifunctional particle coating by plasma process and its application to pollution control. In: RSC Advances. 2014 ; Vol. 4, No. 56. pp. 29866-29875.
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