(Na,K)NbO 3 thin films using metalorganic chemical vapor deposition

Choong Rae Cho, Byung-Moo Moon

Research output: Chapter in Book/Report/Conference proceedingChapter

15 Citations (Scopus)

Abstract

Ferroelectric (Na,K)NbO 3 (NKN) thin films have been synthesized using metalorganic chemical vapor deposition (MOCVD) technique for the first time. The films were deposited on various substrates in a horizontal hot-wall reactor using tetramethyl-heptanedionate (THD) precursors. Epitaxial films have been prepared on SrTiO 3 (001) substrates, while nearly perfect [001]-axis oriented polycrystalline thin films have been deposited on SiO 2/Si, SiN x/Si, and sapphire substrates. Electron Spectroscopy for Chemical Analysis (ESCA) analysis indicated that Na, K, Nb, and O are the primary elements present in the film. Dielectric spectroscopy for NKN films on SiO 2/Si substrates showed dielectric permittivity ε′ about 140 and loss tan δ less than 2 % in the frequency range from 1 kHz to 120 kHz.

Original languageEnglish
Title of host publicationIntegrated Ferroelectrics
Pages39-48
Number of pages10
Volume45
DOIs
Publication statusPublished - 2002

Fingerprint

Metallorganic chemical vapor deposition
metalorganic chemical vapor deposition
Thin films
Substrates
thin films
Dielectric spectroscopy
Electron spectroscopy
Aluminum Oxide
Epitaxial films
chemical analysis
Sapphire
Ferroelectric materials
electron spectroscopy
sapphire
Permittivity
frequency ranges
reactors
permittivity
Chemical analysis
spectroscopy

Keywords

  • (Na,K)NbO thin film
  • Ferroelectrics
  • Metalorganic chemical vapor deposition (MOCVD)
  • Preferential orientation

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

(Na,K)NbO 3 thin films using metalorganic chemical vapor deposition . / Cho, Choong Rae; Moon, Byung-Moo.

Integrated Ferroelectrics. Vol. 45 2002. p. 39-48.

Research output: Chapter in Book/Report/Conference proceedingChapter

Cho, Choong Rae ; Moon, Byung-Moo. / (Na,K)NbO 3 thin films using metalorganic chemical vapor deposition Integrated Ferroelectrics. Vol. 45 2002. pp. 39-48
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