Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template

Heon Lee, K. Y. Yang, S. Hong, C. D. Schaper, G. Y. Jung

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

Original languageEnglish
Title of host publicationDiffusion and Defect Data Pt.B: Solid State Phenomena
Pages661-664
Number of pages4
Volume121-123
EditionPART 1
Publication statusPublished - 2007 Dec 1
EventChina International Conference on Nanoscience and Technology, ChinaNANO 2005 - Beijing, China
Duration: 2005 Jun 92005 Jun 11

Publication series

NameDiffusion and Defect Data Pt.B: Solid State Phenomena
NumberPART 1
Volume121-123
ISSN (Print)10120394

Other

OtherChina International Conference on Nanoscience and Technology, ChinaNANO 2005
CountryChina
CityBeijing
Period05/6/905/6/11

Fingerprint

Polyvinyl Alcohol
polyvinyl alcohol
Polyvinyl alcohols
Lithography
alcohols
Alcohols
templates
lithography
Water
water
resins
Resins
Nanoimprint lithography
Spin coating
releasing
Silicon wafers
durability
Transparency
Strength of materials
coating

Keywords

  • Mirror image pattern
  • Nano-imprint lithography
  • Nano-pattern duplication
  • Poly(vinyl alcohol)
  • Thermally curable monomer
  • Water soluble stamp

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

Lee, H., Yang, K. Y., Hong, S., Schaper, C. D., & Jung, G. Y. (2007). Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template. In Diffusion and Defect Data Pt.B: Solid State Phenomena (PART 1 ed., Vol. 121-123, pp. 661-664). (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).

Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template. / Lee, Heon; Yang, K. Y.; Hong, S.; Schaper, C. D.; Jung, G. Y.

Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. p. 661-664 (Diffusion and Defect Data Pt.B: Solid State Phenomena; Vol. 121-123, No. PART 1).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lee, H, Yang, KY, Hong, S, Schaper, CD & Jung, GY 2007, Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template. in Diffusion and Defect Data Pt.B: Solid State Phenomena. PART 1 edn, vol. 121-123, Diffusion and Defect Data Pt.B: Solid State Phenomena, no. PART 1, vol. 121-123, pp. 661-664, China International Conference on Nanoscience and Technology, ChinaNANO 2005, Beijing, China, 05/6/9.
Lee H, Yang KY, Hong S, Schaper CD, Jung GY. Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template. In Diffusion and Defect Data Pt.B: Solid State Phenomena. PART 1 ed. Vol. 121-123. 2007. p. 661-664. (Diffusion and Defect Data Pt.B: Solid State Phenomena; PART 1).
Lee, Heon ; Yang, K. Y. ; Hong, S. ; Schaper, C. D. ; Jung, G. Y. / Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template. Diffusion and Defect Data Pt.B: Solid State Phenomena. Vol. 121-123 PART 1. ed. 2007. pp. 661-664 (Diffusion and Defect Data Pt.B: Solid State Phenomena; PART 1).
@inproceedings{1539c1ff29d8440eaf89ea322b9bbc7f,
title = "Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template",
abstract = "Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.",
keywords = "Mirror image pattern, Nano-imprint lithography, Nano-pattern duplication, Poly(vinyl alcohol), Thermally curable monomer, Water soluble stamp",
author = "Heon Lee and Yang, {K. Y.} and S. Hong and Schaper, {C. D.} and Jung, {G. Y.}",
year = "2007",
month = "12",
day = "1",
language = "English",
isbn = "3908451302",
volume = "121-123",
series = "Diffusion and Defect Data Pt.B: Solid State Phenomena",
number = "PART 1",
pages = "661--664",
booktitle = "Diffusion and Defect Data Pt.B: Solid State Phenomena",
edition = "PART 1",

}

TY - GEN

T1 - Nano-imprint Lithography of 100nm sized patterns using water soluble PVA, poly(vinyl alcohol), template

AU - Lee, Heon

AU - Yang, K. Y.

AU - Hong, S.

AU - Schaper, C. D.

AU - Jung, G. Y.

PY - 2007/12/1

Y1 - 2007/12/1

N2 - Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

AB - Flexible polyvinyl alcohol (PVA) templates with nano-sized patterns were fabricated by spin coating of PVA resin on silicon master wafer. Since PVA template has enough UV transparency, mechanical strength and thermal durability, it can be used as the template for UV-based and thermal nanoimprint lithography. The replicated patterns on the PVA template were transferred faithfully to the imprinted resin by imprinting lithography. As PVA template was dissolved in water, it was not necessary to deposit a releasing layer on the PVA template surface.

KW - Mirror image pattern

KW - Nano-imprint lithography

KW - Nano-pattern duplication

KW - Poly(vinyl alcohol)

KW - Thermally curable monomer

KW - Water soluble stamp

UR - http://www.scopus.com/inward/record.url?scp=38549113575&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=38549113575&partnerID=8YFLogxK

M3 - Conference contribution

SN - 3908451302

SN - 9783908451303

VL - 121-123

T3 - Diffusion and Defect Data Pt.B: Solid State Phenomena

SP - 661

EP - 664

BT - Diffusion and Defect Data Pt.B: Solid State Phenomena

ER -