Nano-scale texturing of borosilicate glasses using CF4-based plasma discharge for application in thin film solar cells

Hyung Soo Kim, Jung Wook Lim, Sun Jin Yun, Heon Lee, Hee Chul Lee

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF 4/O 2 and CF 4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment.

Original languageEnglish
Pages (from-to)3464-3468
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume12
Issue number4
DOIs
Publication statusPublished - 2012 Jul 6

Fingerprint

Borosilicate glass
Texturing
borosilicate glass
plasma jets
Glass
solar cells
Plasmas
thin films
Gases
glass
Substrates
surface treatment
Gas mixtures
Discharge (fluid mechanics)
Surface morphology
gas flow
gas mixtures
Flow of gases
Surface treatment
bombardment

Keywords

  • Borosilicate glass
  • Plasma treatment
  • Solar cell
  • Surface reflection
  • Texturing

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Chemistry(all)
  • Materials Science(all)
  • Bioengineering
  • Biomedical Engineering

Cite this

Nano-scale texturing of borosilicate glasses using CF4-based plasma discharge for application in thin film solar cells. / Kim, Hyung Soo; Lim, Jung Wook; Yun, Sun Jin; Lee, Heon; Lee, Hee Chul.

In: Journal of Nanoscience and Nanotechnology, Vol. 12, No. 4, 06.07.2012, p. 3464-3468.

Research output: Contribution to journalArticle

@article{2e02db13201d48e6877b83e6980fabdd,
title = "Nano-scale texturing of borosilicate glasses using CF4-based plasma discharge for application in thin film solar cells",
abstract = "Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF 4/O 2 and CF 4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83{\%} and 6.82{\%}, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment.",
keywords = "Borosilicate glass, Plasma treatment, Solar cell, Surface reflection, Texturing",
author = "Kim, {Hyung Soo} and Lim, {Jung Wook} and Yun, {Sun Jin} and Heon Lee and Lee, {Hee Chul}",
year = "2012",
month = "7",
day = "6",
doi = "10.1166/jnn.2012.5565",
language = "English",
volume = "12",
pages = "3464--3468",
journal = "Journal of Nanoscience and Nanotechnology",
issn = "1533-4880",
publisher = "American Scientific Publishers",
number = "4",

}

TY - JOUR

T1 - Nano-scale texturing of borosilicate glasses using CF4-based plasma discharge for application in thin film solar cells

AU - Kim, Hyung Soo

AU - Lim, Jung Wook

AU - Yun, Sun Jin

AU - Lee, Heon

AU - Lee, Hee Chul

PY - 2012/7/6

Y1 - 2012/7/6

N2 - Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF 4/O 2 and CF 4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment.

AB - Random plasma treatment techniques were used as a texturing method to reduce the surface reflection of glass substrates in thin film solar cells. Various gas mixtures were used for the plasma discharge in an effort to examine the texturing mechanism. Using a plasma treatment comprising CF 4/O 2 and CF 4/Ar with a gas flow ratio of 1 to 2, the surface reflectance could be decreased to 6.83% and 6.82%, respectively. The surface treatment was very effective with the use of a low RF power of 50 W and an optimal time of 5 min. It is considered that the optical characteristics of the glass substrate are highly correlated to its surface morphology which can be produced not only through nano-scale chemical reactions with radicals but also through ion flux bombardment.

KW - Borosilicate glass

KW - Plasma treatment

KW - Solar cell

KW - Surface reflection

KW - Texturing

UR - http://www.scopus.com/inward/record.url?scp=84863321167&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84863321167&partnerID=8YFLogxK

U2 - 10.1166/jnn.2012.5565

DO - 10.1166/jnn.2012.5565

M3 - Article

C2 - 22849147

AN - SCOPUS:84863321167

VL - 12

SP - 3464

EP - 3468

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

SN - 1533-4880

IS - 4

ER -