Nano-tribological properties of topographically undulated nanocrystalline diamond patterns

J. H. Kim, S. K. Lee, K. S. Hwang, Oh Myoung Kwon, Dae-Soon Lim

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 μm wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of NanoDiamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy. Copyright

Original languageEnglish
Pages (from-to)344-349
Number of pages6
JournalJournal of Nanoscience and Nanotechnology
Volume11
Issue number1
DOIs
Publication statusPublished - 2011 Jan 1

Fingerprint

Diamond
Nanodiamonds
Diamonds
Friction
diamonds
coefficient of friction
Atomic Force Microscopy
Atomic force microscopy
inoculation
Surface roughness
microscopy
crushing
comminution
Micro-Electrical-Mechanical Systems
scanning
wear tests
Diamond films
Silicon oxides
Crushing
diamond films

Keywords

  • Diamond patterns
  • Lateral force nanocrystalline
  • Nano-tribology

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Chemistry(all)
  • Materials Science(all)
  • Bioengineering
  • Biomedical Engineering

Cite this

Nano-tribological properties of topographically undulated nanocrystalline diamond patterns. / Kim, J. H.; Lee, S. K.; Hwang, K. S.; Kwon, Oh Myoung; Lim, Dae-Soon.

In: Journal of Nanoscience and Nanotechnology, Vol. 11, No. 1, 01.01.2011, p. 344-349.

Research output: Contribution to journalArticle

@article{04aa918513dd44e8be4930bf4b2c59e4,
title = "Nano-tribological properties of topographically undulated nanocrystalline diamond patterns",
abstract = "Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 μm wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of NanoDiamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy. Copyright",
keywords = "Diamond patterns, Lateral force nanocrystalline, Nano-tribology",
author = "Kim, {J. H.} and Lee, {S. K.} and Hwang, {K. S.} and Kwon, {Oh Myoung} and Dae-Soon Lim",
year = "2011",
month = "1",
day = "1",
doi = "10.1166/jnn.2011.3214",
language = "English",
volume = "11",
pages = "344--349",
journal = "Journal of Nanoscience and Nanotechnology",
issn = "1533-4880",
publisher = "American Scientific Publishers",
number = "1",

}

TY - JOUR

T1 - Nano-tribological properties of topographically undulated nanocrystalline diamond patterns

AU - Kim, J. H.

AU - Lee, S. K.

AU - Hwang, K. S.

AU - Kwon, Oh Myoung

AU - Lim, Dae-Soon

PY - 2011/1/1

Y1 - 2011/1/1

N2 - Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 μm wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of NanoDiamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy. Copyright

AB - Surface roughness-controlled nanocrystalline diamond film was fabricated as an undulated line and space pattern on a silicon oxide surface. To simulate a MEMS (Micro-/Electro-Mechanical System) and NEMS (Nano-/Electro-Mechanical System) patterned surface, 800 nm and 1 μm wide lines with a 200 nm wide space pattern were prepared on the substrate using E-beam lithography and an ESAND (Electrostatic Self-assembly of NanoDiamond) seeding layer lift-off process. Through this process, an undulated pattern of a nanocrystalline CVD diamond successfully formed by a conventional micro crystalline diamond growth system. The roughness of the deposited surface was controlled by regulating the size of the seeding nanodiamond particles. Crushing of the nanodiamond aggregates and dispersion of the nanodiamond solution was performed in an attrition milling system. An AFM (Atomic Force Microscopy) probe was used for the wear test and surface profiling of nanocrystalline diamond coatings. 2-D friction coefficient mapping by LFM (Lateral Force Microscopy) scanning showed a low friction coefficient (<0.1) on the line-patterned diamond surface, and a higher friction coefficient (<0.3) on a narrow area adjacent to the undulated pattern edges. With prolonged LFM scanning, the high coefficient of friction was reduced to less than 0.1. The bonding status of the nanocrystalline diamond was analyzed with Raman spectroscopy. Copyright

KW - Diamond patterns

KW - Lateral force nanocrystalline

KW - Nano-tribology

UR - http://www.scopus.com/inward/record.url?scp=84863015970&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84863015970&partnerID=8YFLogxK

U2 - 10.1166/jnn.2011.3214

DO - 10.1166/jnn.2011.3214

M3 - Article

VL - 11

SP - 344

EP - 349

JO - Journal of Nanoscience and Nanotechnology

JF - Journal of Nanoscience and Nanotechnology

SN - 1533-4880

IS - 1

ER -