Nanosized structural anti-reflection layer for thin film solar cells

Kang Soo Han, Ju Hyeon Shin, Kang In Kim, Heon Lee

Research output: Contribution to journalArticle

10 Citations (Scopus)

Abstract

A nanosized pattern layer was formed on the front surface (glass side) of the thin film solar cell using nanoimprint lithography with a Ni based moth-eye imprint mold in order to increase the total conversion efficiency of the amorphous silicon based thin film solar cell. The imprinted pattern layer had nanosized protrusions, which suppressed the reflection of light on the glass surfaces. The nanopatterns were formed using a methacryloxypropyl terminated poly(dimethylsiloxane) (MPDMS) based hard polymeric resin. The reflectance of the thin film solar cell significantly decreased because of the nanosized structural anti-reflection layer, and the total conversion efficiency of the cell increased about 3% compared to the identical solar cell without the nanosized pattern layer. Moreover, the surface exhibited a hydrophobic nature because of the surface nanopatterns and the self-assembled monolayer coating, and this hydrophobicity provided the solar cell with a self-cleaning functionality.

Original languageEnglish
Article number020207
JournalJapanese Journal of Applied Physics
Volume50
Issue number2
DOIs
Publication statusPublished - 2011 Feb 1

Fingerprint

solar cells
thin films
Conversion efficiency
Solar cells
Nanoimprint lithography
Glass
moths
Self assembled monolayers
Polydimethylsiloxane
Hydrophobicity
Amorphous silicon
glass
Cleaning
hydrophobicity
Resins
resins
cleaning
amorphous silicon
Coatings
lithography

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Nanosized structural anti-reflection layer for thin film solar cells. / Han, Kang Soo; Shin, Ju Hyeon; Kim, Kang In; Lee, Heon.

In: Japanese Journal of Applied Physics, Vol. 50, No. 2, 020207, 01.02.2011.

Research output: Contribution to journalArticle

Han, Kang Soo ; Shin, Ju Hyeon ; Kim, Kang In ; Lee, Heon. / Nanosized structural anti-reflection layer for thin film solar cells. In: Japanese Journal of Applied Physics. 2011 ; Vol. 50, No. 2.
@article{2dc43595fb7a473aa4538912b64bdc95,
title = "Nanosized structural anti-reflection layer for thin film solar cells",
abstract = "A nanosized pattern layer was formed on the front surface (glass side) of the thin film solar cell using nanoimprint lithography with a Ni based moth-eye imprint mold in order to increase the total conversion efficiency of the amorphous silicon based thin film solar cell. The imprinted pattern layer had nanosized protrusions, which suppressed the reflection of light on the glass surfaces. The nanopatterns were formed using a methacryloxypropyl terminated poly(dimethylsiloxane) (MPDMS) based hard polymeric resin. The reflectance of the thin film solar cell significantly decreased because of the nanosized structural anti-reflection layer, and the total conversion efficiency of the cell increased about 3{\%} compared to the identical solar cell without the nanosized pattern layer. Moreover, the surface exhibited a hydrophobic nature because of the surface nanopatterns and the self-assembled monolayer coating, and this hydrophobicity provided the solar cell with a self-cleaning functionality.",
author = "Han, {Kang Soo} and Shin, {Ju Hyeon} and Kim, {Kang In} and Heon Lee",
year = "2011",
month = "2",
day = "1",
doi = "10.1143/JJAP.50.020207",
language = "English",
volume = "50",
journal = "Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes",
issn = "0021-4922",
publisher = "Japan Society of Applied Physics",
number = "2",

}

TY - JOUR

T1 - Nanosized structural anti-reflection layer for thin film solar cells

AU - Han, Kang Soo

AU - Shin, Ju Hyeon

AU - Kim, Kang In

AU - Lee, Heon

PY - 2011/2/1

Y1 - 2011/2/1

N2 - A nanosized pattern layer was formed on the front surface (glass side) of the thin film solar cell using nanoimprint lithography with a Ni based moth-eye imprint mold in order to increase the total conversion efficiency of the amorphous silicon based thin film solar cell. The imprinted pattern layer had nanosized protrusions, which suppressed the reflection of light on the glass surfaces. The nanopatterns were formed using a methacryloxypropyl terminated poly(dimethylsiloxane) (MPDMS) based hard polymeric resin. The reflectance of the thin film solar cell significantly decreased because of the nanosized structural anti-reflection layer, and the total conversion efficiency of the cell increased about 3% compared to the identical solar cell without the nanosized pattern layer. Moreover, the surface exhibited a hydrophobic nature because of the surface nanopatterns and the self-assembled monolayer coating, and this hydrophobicity provided the solar cell with a self-cleaning functionality.

AB - A nanosized pattern layer was formed on the front surface (glass side) of the thin film solar cell using nanoimprint lithography with a Ni based moth-eye imprint mold in order to increase the total conversion efficiency of the amorphous silicon based thin film solar cell. The imprinted pattern layer had nanosized protrusions, which suppressed the reflection of light on the glass surfaces. The nanopatterns were formed using a methacryloxypropyl terminated poly(dimethylsiloxane) (MPDMS) based hard polymeric resin. The reflectance of the thin film solar cell significantly decreased because of the nanosized structural anti-reflection layer, and the total conversion efficiency of the cell increased about 3% compared to the identical solar cell without the nanosized pattern layer. Moreover, the surface exhibited a hydrophobic nature because of the surface nanopatterns and the self-assembled monolayer coating, and this hydrophobicity provided the solar cell with a self-cleaning functionality.

UR - http://www.scopus.com/inward/record.url?scp=79951889517&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=79951889517&partnerID=8YFLogxK

U2 - 10.1143/JJAP.50.020207

DO - 10.1143/JJAP.50.020207

M3 - Article

AN - SCOPUS:79951889517

VL - 50

JO - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

JF - Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

SN - 0021-4922

IS - 2

M1 - 020207

ER -