Near-field sub-diffraction photolithography with an elastomeric photomask

Sangyoon Paik; Gwangmook Kim; Sehwan Chang; Sooun Lee; Dana Jin; Kwang Yong Jeong; I. Sak Lee; Jekwan Lee; Hongjae Moon; Jaejun Lee; Kiseok Chang; Su Seok Choi; Jeongmin Moon; Soonshin Jung; Shinill Kang; Wooyoung Lee; Heon Jin Choi; Hyunyong Choi; Hyun Jae Kim; Jae Hyun Lee; Jinwoo Cheon; Miso Kim; Jaemin Myoung; Hong Gyu Park; Wooyoung Shim

doi:10.1038/s41467-020-14439-1

Near-field sub-diffraction photolithography with an elastomeric photomask

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang Yong Jeong, I. Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae Hyun LeeJinwoo Cheon, Miso Kim, Jaemin Myoung, Hong Gyu Park, Wooyoung Shim

Department of Physics

Research output: Contribution to journal › Article › peer-review

20 Citations (Scopus)

Abstract

Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10^th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.

Original language	English
Article number	805
Journal	Nature communications
Volume	11
Issue number	1
DOIs	https://doi.org/10.1038/s41467-020-14439-1
Publication status	Published - 2020 Dec 1

ASJC Scopus subject areas

Chemistry(all)
Biochemistry, Genetics and Molecular Biology(all)
General
Physics and Astronomy(all)

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10.1038/s41467-020-14439-1

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Paik, S., Kim, G., Chang, S., Lee, S., Jin, D., Jeong, K. Y., Lee, I. S., Lee, J., Moon, H., Lee, J., Chang, K., Choi, S. S., Moon, J., Jung, S., Kang, S., Lee, W., Choi, H. J., Choi, H., Kim, H. J., ... Shim, W. (2020). Near-field sub-diffraction photolithography with an elastomeric photomask. Nature communications, 11(1), [805]. https://doi.org/10.1038/s41467-020-14439-1

Paik, S, Kim, G, Chang, S, Lee, S, Jin, D, Jeong, KY, Lee, IS, Lee, J, Moon, H, Lee, J, Chang, K, Choi, SS, Moon, J, Jung, S, Kang, S, Lee, W, Choi, HJ, Choi, H, Kim, HJ, Lee, JH, Cheon, J, Kim, M, Myoung, J, Park, HG & Shim, W 2020, 'Near-field sub-diffraction photolithography with an elastomeric photomask', Nature communications, vol. 11, no. 1, 805. https://doi.org/10.1038/s41467-020-14439-1

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title = "Near-field sub-diffraction photolithography with an elastomeric photomask",

abstract = "Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.",

author = "Sangyoon Paik and Gwangmook Kim and Sehwan Chang and Sooun Lee and Dana Jin and Jeong, {Kwang Yong} and Lee, {I. Sak} and Jekwan Lee and Hongjae Moon and Jaejun Lee and Kiseok Chang and Choi, {Su Seok} and Jeongmin Moon and Soonshin Jung and Shinill Kang and Wooyoung Lee and Choi, {Heon Jin} and Hyunyong Choi and Kim, {Hyun Jae} and Lee, {Jae Hyun} and Jinwoo Cheon and Miso Kim and Jaemin Myoung and Park, {Hong Gyu} and Wooyoung Shim",

note = "Funding Information: This work was supported by LG Display under LGD-Yonsei University Incubation Program, the National Research Foundation of Korea (NRF) grant funded by the Korean government (NRF-2018M3D1A1058793, 2015R1A5A1037668, 2016M3A7B4910798) and grants from the Institute for Basic Science (IBS-R026-D1). J.L. and H.C. were supported by the National Research Foundation of Korea (NRF) through the government of Korea (MSIP) (Grant NRF-2018R1A2A1A05079060). H.-G.P. acknowledges support from National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (grant no. 2018R1A3A3000666). Publisher Copyright: {\textcopyright} 2020, The Author(s).",

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AU - Paik, Sangyoon

AU - Kim, Gwangmook

AU - Chang, Sehwan

AU - Lee, Sooun

AU - Jin, Dana

AU - Jeong, Kwang Yong

AU - Lee, I. Sak

AU - Lee, Jekwan

AU - Moon, Hongjae

AU - Lee, Jaejun

AU - Chang, Kiseok

AU - Choi, Su Seok

AU - Moon, Jeongmin

AU - Jung, Soonshin

AU - Kang, Shinill

AU - Lee, Wooyoung

AU - Choi, Heon Jin

AU - Choi, Hyunyong

AU - Kim, Hyun Jae

AU - Lee, Jae Hyun

AU - Cheon, Jinwoo

AU - Kim, Miso

AU - Myoung, Jaemin

AU - Park, Hong Gyu

AU - Shim, Wooyoung

N1 - Funding Information: This work was supported by LG Display under LGD-Yonsei University Incubation Program, the National Research Foundation of Korea (NRF) grant funded by the Korean government (NRF-2018M3D1A1058793, 2015R1A5A1037668, 2016M3A7B4910798) and grants from the Institute for Basic Science (IBS-R026-D1). J.L. and H.C. were supported by the National Research Foundation of Korea (NRF) through the government of Korea (MSIP) (Grant NRF-2018R1A2A1A05079060). H.-G.P. acknowledges support from National Research Foundation of Korea (NRF) grant funded by the Korean government (MSIT) (grant no. 2018R1A3A3000666). Publisher Copyright: © 2020, The Author(s).

PY - 2020/12/1

Y1 - 2020/12/1

N2 - Photolithography is the prevalent microfabrication technology. It needs to meet resolution and yield demands at a cost that makes it economically viable. However, conventional far-field photolithography has reached the diffraction limit, which imposes complex optics and short-wavelength beam source to achieve high resolution at the expense of cost efficiency. Here, we present a cost-effective near-field optical printing approach that uses metal patterns embedded in a flexible elastomer photomask with mechanical robustness. This technique generates sub-diffraction patterns that are smaller than 1/10th of the wavelength of the incoming light. It can be integrated into existing hardware and standard mercury lamp, and used for a variety of surfaces, such as curved, rough and defect surfaces. This method offers a higher resolution than common light-based printing systems, while enabling parallel-writing. We anticipate that it will be widely used in academic and industrial productions.

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Near-field sub-diffraction photolithography with an elastomeric photomask

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