Near-field sub-diffraction photolithography with an elastomeric photomask

Sangyoon Paik, Gwangmook Kim, Sehwan Chang, Sooun Lee, Dana Jin, Kwang Yong Jeong, I. Sak Lee, Jekwan Lee, Hongjae Moon, Jaejun Lee, Kiseok Chang, Su Seok Choi, Jeongmin Moon, Soonshin Jung, Shinill Kang, Wooyoung Lee, Heon Jin Choi, Hyunyong Choi, Hyun Jae Kim, Jae Hyun LeeJinwoo Cheon, Miso Kim, Jaemin Myoung, Hong Gyu Park, Wooyoung Shim

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