Negative-tone block copolymer lithography by in situ surface chemical modification

Bong Hoon Kim, Kyeong Jae Byeon, Ju Young Kim, Jinseung Kim, Hyeong Min Jin, Joong Yeon Cho, Seong Jun Jeong, Jonghwa Shin, Heon Lee, Sang Ouk Kim

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Negative-tone block copolymer (BCP) lithography based on in situ surface chemical modifi cation is introduced as a highly efficient, versatile self-assembled nanopatterning. BCP blends films consisting of end-functionalized low molecular weight poly(styrene- ran -methyl methacrylate) and polystyrene- block -Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end-functionalized polymers can be covalently bonded during the thermal annealing of BCP thin films. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self-assembled nanodomain formation facilitates single step, site-specific BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self-assembly approaches to produce device oriented laterally ordered nanopatterns.

Original languageEnglish
Pages (from-to)4207-4212
Number of pages6
JournalSmall
Volume10
Issue number20
DOIs
Publication statusPublished - 2014 Oct 29

Fingerprint

Styrene
Chemical modification
Lithography
Block copolymers
Cations
Polymers
Hot Temperature
Molecular Weight
Oxygen
Equipment and Supplies
Substrates
Brushes
Self assembly
Functional groups
polystyrene-block-poly(methyl methacrylate)
Aspect ratio
Polystyrenes
Positive ions
Molecular weight
Annealing

ASJC Scopus subject areas

  • Biomaterials
  • Engineering (miscellaneous)
  • Biotechnology

Cite this

Kim, B. H., Byeon, K. J., Kim, J. Y., Kim, J., Jin, H. M., Cho, J. Y., ... Kim, S. O. (2014). Negative-tone block copolymer lithography by in situ surface chemical modification. Small, 10(20), 4207-4212. https://doi.org/10.1002/smll.201400971

Negative-tone block copolymer lithography by in situ surface chemical modification. / Kim, Bong Hoon; Byeon, Kyeong Jae; Kim, Ju Young; Kim, Jinseung; Jin, Hyeong Min; Cho, Joong Yeon; Jeong, Seong Jun; Shin, Jonghwa; Lee, Heon; Kim, Sang Ouk.

In: Small, Vol. 10, No. 20, 29.10.2014, p. 4207-4212.

Research output: Contribution to journalArticle

Kim, BH, Byeon, KJ, Kim, JY, Kim, J, Jin, HM, Cho, JY, Jeong, SJ, Shin, J, Lee, H & Kim, SO 2014, 'Negative-tone block copolymer lithography by in situ surface chemical modification', Small, vol. 10, no. 20, pp. 4207-4212. https://doi.org/10.1002/smll.201400971
Kim BH, Byeon KJ, Kim JY, Kim J, Jin HM, Cho JY et al. Negative-tone block copolymer lithography by in situ surface chemical modification. Small. 2014 Oct 29;10(20):4207-4212. https://doi.org/10.1002/smll.201400971
Kim, Bong Hoon ; Byeon, Kyeong Jae ; Kim, Ju Young ; Kim, Jinseung ; Jin, Hyeong Min ; Cho, Joong Yeon ; Jeong, Seong Jun ; Shin, Jonghwa ; Lee, Heon ; Kim, Sang Ouk. / Negative-tone block copolymer lithography by in situ surface chemical modification. In: Small. 2014 ; Vol. 10, No. 20. pp. 4207-4212.
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