Negative-tone block copolymer lithography by in situ surface chemical modification

Bong Hoon Kim, Kyeong Jae Byeon, Ju Young Kim, Jinseung Kim, Hyeong Min Jin, Joong Yeon Cho, Seong Jun Jeong, Jonghwa Shin, Heon Lee, Sang Ouk Kim

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

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Medicine & Life Sciences

Chemical Compounds

Engineering & Materials Science