New photo-induced thiol-ene crosslinked films based on linear methacrylate copolymer polythiols

Qian Zhang, Ji Won Hwang, Kyung Nam Kim, Hyun Wook Jung, Seung Man Noh, Jung Kwon Oh

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Thiol-ene radical addition by photolysis is a highly efficient click reaction of sufhydryl groups with reactive enes that has been extensively explored as a promising means to construct multifunctional materials. Here, photo-induced thiol-ene crosslinked films composed of linear methacrylate copolymer polythiols (MCPsh) are reported. Well-defined MCPsh copolymers were prepared by thiol-responsive cleavage of pendant disulfide linkages positioned in the corresponding methacrylate copolymers with narrow molecular weight distribution which were synthesized by a controlled radical polymerization method. With a commercially available multifunctional acrylate as a model ene, photo-induced thiol-ene radical polyaddition of these polythiols is competitive to free-radical homopolymerization of acrylates, yielding crosslinked films exhibiting rapid cure, uniform network, and enhanced mechanical properties; these properties are required for high performance coating materials.

Original languageEnglish
Pages (from-to)2860-2868
Number of pages9
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume51
Issue number13
DOIs
Publication statusPublished - 2013 Jul 1

Keywords

  • atom transfer radical polymerization (ATRP)
  • coatings
  • crosslinking
  • photopolymerization

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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