NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process

Anna Nasonova, Hung Cuong Pham, Dong Joo Kim, Kyo Seon Kim

Research output: Contribution to journalArticle

54 Citations (Scopus)

Abstract

We analyzed the NO and SO2 removal in the non-thermal plasma discharge process combined with TiO2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO2 removal efficiencies obtained in non-thermal plasma-TiO2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO2 by photocatalysts. The NO and SO2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO2.

Original languageEnglish
Pages (from-to)557-561
Number of pages5
JournalChemical Engineering Journal
Volume156
Issue number3
DOIs
Publication statusPublished - 2010 Feb 1
Externally publishedYes

Fingerprint

glass
Photocatalysts
Plasmas
plasma
Glass
Thin films
Hybrid systems
reactor
removal
Chemical vapor deposition
residence time
crack
Gases
Cracks
Electric potential
gas

Keywords

  • NO and SO removal
  • Non-thermal plasma-TiO photocatalysts hybrid process
  • Particle coating
  • Rotating cylindrical PCVD reactor
  • TiO thin film

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Chemistry(all)
  • Industrial and Manufacturing Engineering
  • Environmental Chemistry

Cite this

NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process. / Nasonova, Anna; Pham, Hung Cuong; Kim, Dong Joo; Kim, Kyo Seon.

In: Chemical Engineering Journal, Vol. 156, No. 3, 01.02.2010, p. 557-561.

Research output: Contribution to journalArticle

Nasonova, Anna ; Pham, Hung Cuong ; Kim, Dong Joo ; Kim, Kyo Seon. / NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process. In: Chemical Engineering Journal. 2010 ; Vol. 156, No. 3. pp. 557-561.
@article{aea9e96470544c6da2a22c6bf023eff1,
title = "NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process",
abstract = "We analyzed the NO and SO2 removal in the non-thermal plasma discharge process combined with TiO2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO2 removal efficiencies obtained in non-thermal plasma-TiO2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO2 by photocatalysts. The NO and SO2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO2.",
keywords = "NO and SO removal, Non-thermal plasma-TiO photocatalysts hybrid process, Particle coating, Rotating cylindrical PCVD reactor, TiO thin film",
author = "Anna Nasonova and Pham, {Hung Cuong} and Kim, {Dong Joo} and Kim, {Kyo Seon}",
year = "2010",
month = "2",
day = "1",
doi = "10.1016/j.cej.2009.04.037",
language = "English",
volume = "156",
pages = "557--561",
journal = "Chemical Engineering Journal",
issn = "1385-8947",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - NO and SO2 removal in non-thermal plasma reactor packed with glass beads-TiO2 thin film coated by PCVD process

AU - Nasonova, Anna

AU - Pham, Hung Cuong

AU - Kim, Dong Joo

AU - Kim, Kyo Seon

PY - 2010/2/1

Y1 - 2010/2/1

N2 - We analyzed the NO and SO2 removal in the non-thermal plasma discharge process combined with TiO2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO2 removal efficiencies obtained in non-thermal plasma-TiO2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO2 by photocatalysts. The NO and SO2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO2.

AB - We analyzed the NO and SO2 removal in the non-thermal plasma discharge process combined with TiO2 photocatalyst. The non-thermal plasmas were generated by dielectric barrier discharge with glass beads as dielectric materials. The TiO2 thin films were coated on the glass beads uniformly without crack by a rotating cylindrical plasma chemical vapor deposition reactor. The NO and SO2 removal efficiencies obtained in non-thermal plasma-TiO2 photocatalysts hybrid system were higher than those in plasma process only, because of the additional removal of NO and SO2 by photocatalysts. The NO and SO2 removal efficiencies become higher, as applied peak voltage, pulse frequency and gas residence time increase, or as the initial NO and SO2 concentrations decrease. The hybrid system of non-thermal plasma and photocatalyst thin film on glass beads prepared by PCVD process is quite efficient method to remove NO and SO2.

KW - NO and SO removal

KW - Non-thermal plasma-TiO photocatalysts hybrid process

KW - Particle coating

KW - Rotating cylindrical PCVD reactor

KW - TiO thin film

UR - http://www.scopus.com/inward/record.url?scp=74149090514&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=74149090514&partnerID=8YFLogxK

U2 - 10.1016/j.cej.2009.04.037

DO - 10.1016/j.cej.2009.04.037

M3 - Article

AN - SCOPUS:74149090514

VL - 156

SP - 557

EP - 561

JO - Chemical Engineering Journal

JF - Chemical Engineering Journal

SN - 1385-8947

IS - 3

ER -