Nondestructive Photopatterning of Heavy-Metal-Free Quantum Dots

Jeehye Yang, Myeongjae Lee, Se Young Park, Myoungjin Park, Jonghoon Kim, Niranjan Sitapure, Donghyo Hahm, Seunghyun Rhee, Daeyeon Lee, Hyunwoo Jo, Yong Hyun Jo, Jaemin Lim, Jungwook Kim, Tae Joo Shin, Doh C. Lee, Kyungwon Kwak, Joseph S. Kwon, Bong Soo Kim, Wan Ki Bae, Moon Sung Kang

Research output: Contribution to journalArticlepeer-review

Abstract

Electroluminescence from quantum dots (QDs) is a suitable photon source for futuristic displays offering hyper-realistic images with free-form factors. Accordingly, a nondestructive and scalable process capable of rendering multicolored QD patterns on a scale of several micrometers needs to be established. Here, nondestructive direct photopatterning for heavy-metal-free QDs is reported using branched light-driven ligand crosslinkers (LiXers) containing multiple azide units. The branched LiXers effectively interlock QD films via photo-crosslinking native aliphatic QD surface ligands without compromising the intrinsic optoelectronic properties of QDs. Using branched LiXers with six sterically engineered azide units, RGB QD patterns are achieved on the micrometer scale. The photo-crosslinking process does not affect the photoluminescence and electroluminescence characteristics of QDs and extends the device lifetime. This nondestructive method can be readily adapted to industrial processes and make an immediate impact on display technologies, as it uses widely available photolithography facilities and high-quality heavy-metal-free QDs with aliphatic ligands.

Original languageEnglish
Article number2205504
JournalAdvanced Materials
Volume34
Issue number43
DOIs
Publication statusPublished - 2022 Oct 26

Keywords

  • heavy-metal-free quantum dots
  • high-resolution patterning
  • ligand crosslinking
  • photopatterning

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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