Nonsymmetrical modified chemical vapor deposition (N-MCVD) process

Juraj Doupovec, Alexander Yarin

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

A novel, simple fabrication method of circularly and axially nonsymmetrical MCVD layers is proposed. The thermophoretic mechanism is regulated by means of two linear heaters and coolers, respectively, which change the circular symmetry of the thermophoretic deposition mechanism of the standard MCVD process. A theoretical description of the thermophoretic deposition mechanism inside the substrate tube in some simplified conditions is given. The differential equations governing mass transport through the thermophoretic effect are solved in closed form. As an example a preform of the dumbell form core has been fabricated.

Original languageEnglish
Pages (from-to)695-700
Number of pages6
JournalJournal of Lightwave Technology
Volume9
Issue number6
DOIs
Publication statusPublished - 1991 Jun 1
Externally publishedYes

Fingerprint

Chemical vapor deposition
vapor deposition
Differential equations
preforms
Mass transfer
coolers
heaters
Fabrication
differential equations
Substrates
tubes
fabrication
symmetry

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Atomic and Molecular Physics, and Optics

Cite this

Nonsymmetrical modified chemical vapor deposition (N-MCVD) process. / Doupovec, Juraj; Yarin, Alexander.

In: Journal of Lightwave Technology, Vol. 9, No. 6, 01.06.1991, p. 695-700.

Research output: Contribution to journalArticle

Doupovec, Juraj ; Yarin, Alexander. / Nonsymmetrical modified chemical vapor deposition (N-MCVD) process. In: Journal of Lightwave Technology. 1991 ; Vol. 9, No. 6. pp. 695-700.
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