Novel complex nanostructure from directed assembly of block copolymers on incommensurate surface patterns

Sang Ouk Kim, Bong Hoon Kim, Dong Meng, Dong Ok Shin, Chong Min Koo, Harun H. Solak, Qiang Wang

Research output: Contribution to journalArticle

62 Citations (Scopus)

Abstract

The directed assembly of a block copolymer on a chemically patterned surface may produce a well-registered novel complex nanostructure was demonstrated. When a cylinder-forming block copolymer was assembled on a chemical pattern, a 3D structure was produced that provides linear arrays of nanocylinders whose orientation is registered by the surface pattern underneath. The cylinders in the block copolymer thin film were spontaneously oriented normal to the neutral homogeneous SAM surface due to the thin-film confinement. The top-view scanning electron microscopy (SEM) showed the hexatic arrangement of cylinders, and a cross-sectional image demonstrated that the cylinders were oriented perpendicular to surface throughout the film thickness. Real-space self-consistent field (SCF) calculations used for the self-assembled morphology of block copolymers provided insights into the 3D structure inside thin films.

Original languageEnglish
Pages (from-to)3271-3275
Number of pages5
JournalAdvanced Materials
Volume19
Issue number20
DOIs
Publication statusPublished - 2007 Oct 19
Externally publishedYes

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Block copolymers
Nanostructures
Thin films
Film thickness
Scanning electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Novel complex nanostructure from directed assembly of block copolymers on incommensurate surface patterns. / Kim, Sang Ouk; Kim, Bong Hoon; Meng, Dong; Shin, Dong Ok; Koo, Chong Min; Solak, Harun H.; Wang, Qiang.

In: Advanced Materials, Vol. 19, No. 20, 19.10.2007, p. 3271-3275.

Research output: Contribution to journalArticle

Kim, Sang Ouk ; Kim, Bong Hoon ; Meng, Dong ; Shin, Dong Ok ; Koo, Chong Min ; Solak, Harun H. ; Wang, Qiang. / Novel complex nanostructure from directed assembly of block copolymers on incommensurate surface patterns. In: Advanced Materials. 2007 ; Vol. 19, No. 20. pp. 3271-3275.
@article{a319a993c145413ea7306652b2b5fb0d,
title = "Novel complex nanostructure from directed assembly of block copolymers on incommensurate surface patterns",
abstract = "The directed assembly of a block copolymer on a chemically patterned surface may produce a well-registered novel complex nanostructure was demonstrated. When a cylinder-forming block copolymer was assembled on a chemical pattern, a 3D structure was produced that provides linear arrays of nanocylinders whose orientation is registered by the surface pattern underneath. The cylinders in the block copolymer thin film were spontaneously oriented normal to the neutral homogeneous SAM surface due to the thin-film confinement. The top-view scanning electron microscopy (SEM) showed the hexatic arrangement of cylinders, and a cross-sectional image demonstrated that the cylinders were oriented perpendicular to surface throughout the film thickness. Real-space self-consistent field (SCF) calculations used for the self-assembled morphology of block copolymers provided insights into the 3D structure inside thin films.",
author = "Kim, {Sang Ouk} and Kim, {Bong Hoon} and Dong Meng and Shin, {Dong Ok} and Koo, {Chong Min} and Solak, {Harun H.} and Qiang Wang",
year = "2007",
month = "10",
day = "19",
doi = "10.1002/adma.200700957",
language = "English",
volume = "19",
pages = "3271--3275",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "20",

}

TY - JOUR

T1 - Novel complex nanostructure from directed assembly of block copolymers on incommensurate surface patterns

AU - Kim, Sang Ouk

AU - Kim, Bong Hoon

AU - Meng, Dong

AU - Shin, Dong Ok

AU - Koo, Chong Min

AU - Solak, Harun H.

AU - Wang, Qiang

PY - 2007/10/19

Y1 - 2007/10/19

N2 - The directed assembly of a block copolymer on a chemically patterned surface may produce a well-registered novel complex nanostructure was demonstrated. When a cylinder-forming block copolymer was assembled on a chemical pattern, a 3D structure was produced that provides linear arrays of nanocylinders whose orientation is registered by the surface pattern underneath. The cylinders in the block copolymer thin film were spontaneously oriented normal to the neutral homogeneous SAM surface due to the thin-film confinement. The top-view scanning electron microscopy (SEM) showed the hexatic arrangement of cylinders, and a cross-sectional image demonstrated that the cylinders were oriented perpendicular to surface throughout the film thickness. Real-space self-consistent field (SCF) calculations used for the self-assembled morphology of block copolymers provided insights into the 3D structure inside thin films.

AB - The directed assembly of a block copolymer on a chemically patterned surface may produce a well-registered novel complex nanostructure was demonstrated. When a cylinder-forming block copolymer was assembled on a chemical pattern, a 3D structure was produced that provides linear arrays of nanocylinders whose orientation is registered by the surface pattern underneath. The cylinders in the block copolymer thin film were spontaneously oriented normal to the neutral homogeneous SAM surface due to the thin-film confinement. The top-view scanning electron microscopy (SEM) showed the hexatic arrangement of cylinders, and a cross-sectional image demonstrated that the cylinders were oriented perpendicular to surface throughout the film thickness. Real-space self-consistent field (SCF) calculations used for the self-assembled morphology of block copolymers provided insights into the 3D structure inside thin films.

UR - http://www.scopus.com/inward/record.url?scp=35748939070&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=35748939070&partnerID=8YFLogxK

U2 - 10.1002/adma.200700957

DO - 10.1002/adma.200700957

M3 - Article

AN - SCOPUS:35748939070

VL - 19

SP - 3271

EP - 3275

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 20

ER -