Novel hybrid mask mold for combined nanoimprint and photolithography technique

Kanghun Moon, Banglim Choi, In Sung Park, Sunghun Hong, Kihyun Yang, Heon Lee, Jinho Ahn

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We present a combined nanoimprint and photolithography (CNP) process for nano-size patterning to greatly simplify conventional ultraviolet nanoimprint lithography. The mold is a key component for precise patterning with CNP, and a novel hybrid mask mold with SiO2 interlayer and hydrophobic agent treatment is suggested for easy detachment after imprinting. This allows a very simple process to get a complete pattern transfer without any defects.

Original languageEnglish
Pages (from-to)889-892
Number of pages4
JournalMicroelectronic Engineering
Volume83
Issue number4-9 SPEC. ISS.
DOIs
Publication statusPublished - 2006 Apr 1

Keywords

  • Anti-sticking property
  • Hybrid mask mold
  • Nanoimprint lithography
  • Photolithography

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

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  • Cite this

    Moon, K., Choi, B., Park, I. S., Hong, S., Yang, K., Lee, H., & Ahn, J. (2006). Novel hybrid mask mold for combined nanoimprint and photolithography technique. Microelectronic Engineering, 83(4-9 SPEC. ISS.), 889-892. https://doi.org/10.1016/j.mee.2006.01.055