Observation of Ni silicide formations and field emission properties of Ni silicide nanowires

Joondong Kim, Eung Sug Lee, Chang-Soo Han, Youngjin Kang, Dojin Kim, Wayne A. Anderson

Research output: Contribution to journalArticle

25 Citations (Scopus)


The Ni silicide nanowires were grown by physical vapor deposition. The morphological changes of silicide formation were observed on a gradient Ni film thickness, which visualized the critical thickness is 60-80 nm to grow nanowires. The field emission measurement provided uniform characteristics and high field enhancement factors were obtained to be 3180 and 3002 from the Ni silicide nanowires grown on a Si substrate and a tungsten plate, respectively. By using a conductive tungsten plate, the emission current was enhanced to be 172.5 μA/cm2 comparing to 76.5 μA/cm2 from a Si substrate at 5 V/μm.

Original languageEnglish
Pages (from-to)1709-1712
Number of pages4
JournalMicroelectronic Engineering
Issue number8
Publication statusPublished - 2008 Aug 1
Externally publishedYes


  • Field emission
  • Growth condition
  • Ni silicide nanowires

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics

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