On the self-assembly of brush block copolymers in thin films

Sung Woo Hong, Weiyin Gu, June Huh, Benjamin R. Sveinbjornsson, Gajin Jeong, Robert Howard Grubbs, Thomas P. Russell

Research output: Contribution to journalArticle

54 Citations (Scopus)

Abstract

We describe a simple route to fabricate two dimensionally well-ordered, periodic nanopatterns using the self-assembly of brush block copolymers (brush BCPs). Well-developed lamellar microdomains oriented perpendicular to the substrate are achieved, without modification of the underlying substrates, and structures with feature sizes greater than 200 nm are generated due to the reduced degree of chain entanglements of brush BCPs. A near-perfect linear scaling law was found for the period, L, as a function of backbone degree of polymerization (DP) for two series of brush BCPs. The exponent increases slightly from 0.99 to 1.03 as the side chain molecular weight increases from ∼2.4 to ∼4.5 kg/mol-1 and saturated with further increase in the side chain molecular weight due to the entropic penalty associated with the packing of the side chains. Porous templates and scaffolds from brush BCP thin films are also obtained by selective etching of one component.

Original languageEnglish
Pages (from-to)9684-9692
Number of pages9
JournalACS Nano
Volume7
Issue number11
DOIs
Publication statusPublished - 2013 Nov 26
Externally publishedYes

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Keywords

  • brush polymers
  • large feature sizes
  • periodic nanopatterns
  • self-assembly
  • solvent-annealing

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Hong, S. W., Gu, W., Huh, J., Sveinbjornsson, B. R., Jeong, G., Grubbs, R. H., & Russell, T. P. (2013). On the self-assembly of brush block copolymers in thin films. ACS Nano, 7(11), 9684-9692. https://doi.org/10.1021/nn402639g