One-step combined-nanolithography-and-photolithography for a 2D photonic crystal TM polarizer

Kyung Hak Choi, Jinwoo Huh, Yonghao Cui, Krutarth Trivedi, Walter Hu, Byeong Kwon Ju, Jeong Bong Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.

Original languageEnglish
Article numbermi5020228
Pages (from-to)228-238
Number of pages11
JournalMicromachines
Volume5
Issue number2
DOIs
Publication statusPublished - 2014 Jan 1

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Control and Systems Engineering
  • Mechanical Engineering

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    Choi, K. H., Huh, J., Cui, Y., Trivedi, K., Hu, W., Ju, B. K., & Lee, J. B. (2014). One-step combined-nanolithography-and-photolithography for a 2D photonic crystal TM polarizer. Micromachines, 5(2), 228-238. [mi5020228]. https://doi.org/10.3390/mi5020228