Optically Patternable Metamaterial below Diffraction Limit

Youngseop Lee, Sang Gil Park, Seokjae Yoo, Minhee Kang, Sang Chul Jeon, Young Su Kim, Q Han Park, Ki Hun Jeong

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

Original languageEnglish
Pages (from-to)18405-18409
Number of pages5
JournalACS Applied Materials and Interfaces
Volume9
Issue number22
DOIs
Publication statusPublished - 2017 Jun 7

Fingerprint

Metamaterials
Nanolithography
Diffraction
Silver
Polymers
Spin coating
Photoresists
Permittivity

Keywords

  • meta-photoresist
  • subdiffraction limit
  • superlens effect
  • surface plasmon excitation
  • ultraviolet nanolithography

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Lee, Y., Park, S. G., Yoo, S., Kang, M., Jeon, S. C., Kim, Y. S., ... Jeong, K. H. (2017). Optically Patternable Metamaterial below Diffraction Limit. ACS Applied Materials and Interfaces, 9(22), 18405-18409. https://doi.org/10.1021/acsami.7b02940

Optically Patternable Metamaterial below Diffraction Limit. / Lee, Youngseop; Park, Sang Gil; Yoo, Seokjae; Kang, Minhee; Jeon, Sang Chul; Kim, Young Su; Park, Q Han; Jeong, Ki Hun.

In: ACS Applied Materials and Interfaces, Vol. 9, No. 22, 07.06.2017, p. 18405-18409.

Research output: Contribution to journalArticle

Lee, Y, Park, SG, Yoo, S, Kang, M, Jeon, SC, Kim, YS, Park, QH & Jeong, KH 2017, 'Optically Patternable Metamaterial below Diffraction Limit', ACS Applied Materials and Interfaces, vol. 9, no. 22, pp. 18405-18409. https://doi.org/10.1021/acsami.7b02940
Lee Y, Park SG, Yoo S, Kang M, Jeon SC, Kim YS et al. Optically Patternable Metamaterial below Diffraction Limit. ACS Applied Materials and Interfaces. 2017 Jun 7;9(22):18405-18409. https://doi.org/10.1021/acsami.7b02940
Lee, Youngseop ; Park, Sang Gil ; Yoo, Seokjae ; Kang, Minhee ; Jeon, Sang Chul ; Kim, Young Su ; Park, Q Han ; Jeong, Ki Hun. / Optically Patternable Metamaterial below Diffraction Limit. In: ACS Applied Materials and Interfaces. 2017 ; Vol. 9, No. 22. pp. 18405-18409.
@article{143eb6a260bb43538ac58b05c9c1b1e6,
title = "Optically Patternable Metamaterial below Diffraction Limit",
abstract = "We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.",
keywords = "meta-photoresist, subdiffraction limit, superlens effect, surface plasmon excitation, ultraviolet nanolithography",
author = "Youngseop Lee and Park, {Sang Gil} and Seokjae Yoo and Minhee Kang and Jeon, {Sang Chul} and Kim, {Young Su} and Park, {Q Han} and Jeong, {Ki Hun}",
year = "2017",
month = "6",
day = "7",
doi = "10.1021/acsami.7b02940",
language = "English",
volume = "9",
pages = "18405--18409",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "22",

}

TY - JOUR

T1 - Optically Patternable Metamaterial below Diffraction Limit

AU - Lee, Youngseop

AU - Park, Sang Gil

AU - Yoo, Seokjae

AU - Kang, Minhee

AU - Jeon, Sang Chul

AU - Kim, Young Su

AU - Park, Q Han

AU - Jeong, Ki Hun

PY - 2017/6/7

Y1 - 2017/6/7

N2 - We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

AB - We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

KW - meta-photoresist

KW - subdiffraction limit

KW - superlens effect

KW - surface plasmon excitation

KW - ultraviolet nanolithography

UR - http://www.scopus.com/inward/record.url?scp=85020409680&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85020409680&partnerID=8YFLogxK

U2 - 10.1021/acsami.7b02940

DO - 10.1021/acsami.7b02940

M3 - Article

VL - 9

SP - 18405

EP - 18409

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 22

ER -