Engineering & Materials Science
Metallorganic chemical vapor deposition
100%
Sapphire
84%
Chemical activation
56%
Substrates
44%
Annealing
41%
Air
34%
Photoluminescence
34%
Rapid thermal annealing
32%
Secondary ion mass spectrometry
31%
Epitaxial growth
29%
Optical properties
26%
Doping (additives)
23%
Nitrogen
19%
Furnaces
18%
Oxygen
17%
Temperature
16%
Gases
12%
Physics & Astronomy
metalorganic chemical vapor deposition
60%
sapphire
53%
activation
50%
annealing
38%
air
37%
secondary ion mass spectrometry
21%
furnaces
19%
nitrogen
15%
photoluminescence
14%
optical properties
13%
oxygen
12%
temperature
12%
gases
10%
Chemical Compounds
Annealing
49%
Rapid Thermal Annealing
47%
Epitaxial Growth
38%
Secondary Ion Mass Spectroscopy
34%
Photoluminescence
24%
Optical Property
23%
Time
22%
Nitrogen
19%
Gas
16%
Dioxygen
15%
Liquid Film
15%