Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor

Sung Joong Choo, Byung Chul Lee, Sang Myung Lee, Jung ho Park, Hyun Joon Shin

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

In this paper, silicon oxynitride layers deposited with different plasma-enhanced chemical vapor deposition (PECVD) conditions were fabricated and optimized, in order to make an interferometric sensor for detecting biochemical reactions. For the optimization of PECVD silicon oxynitride layers, the influence of the N2O/SiH4 gas flow ratio was investigated. RF power in the PEVCD process was also adjusted under the optimized N 2O/SiH4 gas flow ratio. The optimized silicon oxynitride layer was deposited with 15 W in chamber under 25/150 sccm of N 2O/SiH4 gas flow rates. The clad layer was deposited with 20 W in chamber under 400/150 sccm of N2O/SiH4 gas flow condition. An integrated Mach-Zehnder interferometric biosensor based on optical waveguide technology was fabricated under the optimized PECVD conditions. The adsorption reaction between bovine serum albumin (BSA) and the silicon oxynitride surface was performed and verified with this device.

Original languageEnglish
Article number095007
JournalJournal of Micromechanics and Microengineering
Volume19
Issue number9
DOIs
Publication statusPublished - 2009 Nov 9

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Silicon
Plasma enhanced chemical vapor deposition
Biosensors
Flow of gases
Optical waveguides
Bovine Serum Albumin
Mach number
Flow rate
Adsorption
Sensors

ASJC Scopus subject areas

  • Mechanical Engineering
  • Electrical and Electronic Engineering
  • Mechanics of Materials
  • Electronic, Optical and Magnetic Materials

Cite this

Optimization of silicon oxynitrides by plasma-enhanced chemical vapor deposition for an interferometric biosensor. / Choo, Sung Joong; Lee, Byung Chul; Lee, Sang Myung; Park, Jung ho; Shin, Hyun Joon.

In: Journal of Micromechanics and Microengineering, Vol. 19, No. 9, 095007, 09.11.2009.

Research output: Contribution to journalArticle

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