Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Jaewon Choi, Yinyong Li, Paul Y. Kim, Feng Liu, Hyeyoung Kim, Duk Man Yu, June Huh, Kenneth R. Carter, Thomas P. Russell

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Original languageEnglish
Pages (from-to)8324-8332
Number of pages9
JournalACS Applied Materials and Interfaces
Volume10
Issue number9
DOIs
Publication statusPublished - 2018 Mar 7

Fingerprint

Block copolymers
Capillary flow
X ray scattering
Film thickness
Nanostructures
Vapors
Annealing
Fabrication

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Choi, J., Li, Y., Kim, P. Y., Liu, F., Kim, H., Yu, D. M., ... Russell, T. P. (2018). Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns. ACS Applied Materials and Interfaces, 10(9), 8324-8332. https://doi.org/10.1021/acsami.7b17713

Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns. / Choi, Jaewon; Li, Yinyong; Kim, Paul Y.; Liu, Feng; Kim, Hyeyoung; Yu, Duk Man; Huh, June; Carter, Kenneth R.; Russell, Thomas P.

In: ACS Applied Materials and Interfaces, Vol. 10, No. 9, 07.03.2018, p. 8324-8332.

Research output: Contribution to journalArticle

Choi, J, Li, Y, Kim, PY, Liu, F, Kim, H, Yu, DM, Huh, J, Carter, KR & Russell, TP 2018, 'Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns', ACS Applied Materials and Interfaces, vol. 10, no. 9, pp. 8324-8332. https://doi.org/10.1021/acsami.7b17713
Choi, Jaewon ; Li, Yinyong ; Kim, Paul Y. ; Liu, Feng ; Kim, Hyeyoung ; Yu, Duk Man ; Huh, June ; Carter, Kenneth R. ; Russell, Thomas P. / Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns. In: ACS Applied Materials and Interfaces. 2018 ; Vol. 10, No. 9. pp. 8324-8332.
@article{6dfc009b86fe4f1182207647f6ce0025,
title = "Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns",
abstract = "We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.",
author = "Jaewon Choi and Yinyong Li and Kim, {Paul Y.} and Feng Liu and Hyeyoung Kim and Yu, {Duk Man} and June Huh and Carter, {Kenneth R.} and Russell, {Thomas P.}",
year = "2018",
month = "3",
day = "7",
doi = "10.1021/acsami.7b17713",
language = "English",
volume = "10",
pages = "8324--8332",
journal = "ACS applied materials & interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
number = "9",

}

TY - JOUR

T1 - Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

AU - Choi, Jaewon

AU - Li, Yinyong

AU - Kim, Paul Y.

AU - Liu, Feng

AU - Kim, Hyeyoung

AU - Yu, Duk Man

AU - Huh, June

AU - Carter, Kenneth R.

AU - Russell, Thomas P.

PY - 2018/3/7

Y1 - 2018/3/7

N2 - We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

AB - We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

UR - http://www.scopus.com/inward/record.url?scp=85043336581&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85043336581&partnerID=8YFLogxK

U2 - 10.1021/acsami.7b17713

DO - 10.1021/acsami.7b17713

M3 - Article

VL - 10

SP - 8324

EP - 8332

JO - ACS applied materials & interfaces

JF - ACS applied materials & interfaces

SN - 1944-8244

IS - 9

ER -