Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Jaewon Choi, Yinyong Li, Paul Y. Kim, Feng Liu, Hyeyoung Kim, Duk Man Yu, June Huh, Kenneth R. Carter, Thomas P. Russell

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

We demonstrate the generation of block copolymer (BCP) line patterns oriented orthogonal to a very small (minimal) topographic trench pattern over arbitrarily large areas using solvent-vapor annealing. Increasing the thickness of BCP films induced an orthogonal alignment of the BCP cylindrical microdomains, where full orthogonal alignment of the cylindrical microdomains with respect to the trench direction was obtained at a film thickness corresponding to 1.70L0. A capillary flow of the solvent across the trenches was a critical factor in the alignment of the cylindrical microdomains. Grazing incidence small-angle X-ray scattering was used to determine the orientation function of the microdomains, with a value of 0.997 being found reflecting a nearly perfect orientation. This approach to produce orthogonally aligned BCP line patterns could be extended to the nanomanufacturing and fabrication of hierarchical nanostructures.

Original languageEnglish
Pages (from-to)8324-8332
Number of pages9
JournalACS Applied Materials and Interfaces
Volume10
Issue number9
DOIs
Publication statusPublished - 2018 Mar 7

ASJC Scopus subject areas

  • Materials Science(all)

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