Orthogonally Aligned Block Copolymer Line Patterns on Minimal Topographic Patterns

Jaewon Choi, Yinyong Li, Paul Y. Kim, Feng Liu, Hyeyoung Kim, Duk Man Yu, June Huh, Kenneth R. Carter, Thomas P. Russell

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds