Oscillatory penetration of near-fields in plasmonic excitation at metal-dielectric interfaces

S. C. Lee, J. H. Kang, Q Han Park, S. Krishna, S. R J Brueck

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

The electric field immediately below an illuminated metal-film that is perforated with a hole array on a dielectric consists of direct transmission and scattering of the incident light through the holes and evanescent near-field from plasmonic excitations. Depending on the size and shape of the hole apertures, it exhibits an oscillatory decay in the propagation direction. This unusual field penetration is explained by the interference between these contributions, and is experimentally confirmed through an aperture which is engineered with four arms stretched out from a simple circle to manipulate a specific plasmonic excitation available in the metal film. A numerical simulation quantitatively supports the experiment. This fundamental characteristic will impact plasmonics with the near-fields designed by aperture engineering for practical applications.

Original languageEnglish
Article number24400
JournalScientific Reports
Volume6
DOIs
Publication statusPublished - 2016 Apr 19

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near fields
penetration
apertures
metal films
metals
excitation
engineering
interference
propagation
electric fields
decay
scattering
simulation

ASJC Scopus subject areas

  • General

Cite this

Oscillatory penetration of near-fields in plasmonic excitation at metal-dielectric interfaces. / Lee, S. C.; Kang, J. H.; Park, Q Han; Krishna, S.; Brueck, S. R J.

In: Scientific Reports, Vol. 6, 24400, 19.04.2016.

Research output: Contribution to journalArticle

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