Oxygen-plasma treatment for low-temperature processing of lead-zirconate-titanate thin films

Eung Ryul Park, Hyuk Kyoo Jang, Eung Kil Kang, Cheol Eui Lee

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Low-temperature processing of ferroelectric thin films has remained a major barrier to their practical applications. In this work, RF and microwave oxygen-plasma treatment has been employed for low-temperature processing of ferroelectric thin films of sol-gel-derived Pb(Zrx,Ti1-x)O3 (PZT). The as-coated PZT films were annealed in oxygen ambience at 450-°C. Subsequent RF oxygen-plasma treatment at 200 and 300-°C resulted in fair ferroelectric hystereses. Besides, room-temperature microwave oxygen-plasma treatment gave rise to remanent polarizations as large as 15-μC/cm 2.

Original languageEnglish
Pages (from-to)536-540
Number of pages5
JournalMaterials Research Bulletin
Volume41
Issue number3
DOIs
Publication statusPublished - 2006 Mar 9

Keywords

  • A. Thin films
  • B. Epitaxial growth
  • C. Photoelectron spectroscopy
  • D. Ferroelectricity

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry

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