Performance and transport characteristics of α,ω -dihexylsexithiophene- based transistors with a high roomerature mobility of 0.16 cm2 v s

Hoon Seok Seo, Ying Zhang, Young Se Jang, Jong Ho Choi

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

Organic thin-film transistors (OTFTs) based upon α,ω -dihexylsexithiophene (DH6T) have been fabricated and characterized. The DH6T thin films were prepared using neutral cluster beam deposition (NCBD) methods on roomerature Si O2 substrates. The effects of surface modification were examined. The geometric effects of the gate dielectric thickness, channel length, and width on the device characteristics were also systematically studied. A combination of the NCBD technique and octadecyltrichlorosilane (OTS) pretreatment was most efficient for producing high-quality crystalline DH6T films. The temperature dependence of the field-effect mobility (μeff) indicated that the transistor performance was strongly correlated with the structural and morphological properties of the DH6T active layers and that the surfactant pretreatment significantly enhanced the μeff. A roomerature μeff of 0.16 cm2 V s for the OTS-pretreated transistors was found to be best so far reported for DH6T-based OTFTs using a Si O2 gate dielectric layer.

Original languageEnglish
Article number223310
JournalApplied Physics Letters
Volume92
Issue number22
DOIs
Publication statusPublished - 2008

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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