Phase-field modeling of step dynamics

J. S. Lowengrub, Zhengzheng Hu, S. M. Wise, Junseok Kim, A. Voigt

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

A phase-field model is used to simulate the dynamics of step-flow during epitaxial growth. An efficient numerical method is developed using a second order accurate fully implicit time discretization together with a second order accurate finite difference spatial discretization. To test the algorithm, we focus on simulations of kinetic instabilities that arise due to the anisotropy of adsorption (attachment) rates at steps from the upper and lower terraces during growth. When the attachment rate from the lower terrace is larger than that from the upper terrace (Ehrlich-Schwoebel effect), step meandering occurs. When the opposite is true of the rates, step bunching occurs. Step-step interactions are seen to reduce the meandering instability.

Original languageEnglish
Title of host publicationMaterials Research Society Symposium Proceedings
Pages118-123
Number of pages6
Volume859
Publication statusPublished - 2004 Dec 1
Externally publishedYes
Event2004 MRS Fall Meeting - Boston, MA, United States
Duration: 2004 Nov 292004 Dec 3

Other

Other2004 MRS Fall Meeting
CountryUnited States
CityBoston, MA
Period04/11/2904/12/3

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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  • Cite this

    Lowengrub, J. S., Hu, Z., Wise, S. M., Kim, J., & Voigt, A. (2004). Phase-field modeling of step dynamics. In Materials Research Society Symposium Proceedings (Vol. 859, pp. 118-123)