Photo-assisted direct writing of conducting aluminum

Seong Don Hwang, Dongjin Byun, J. A. Glass, Brian Robertson, J. T. Spencer, S. Datta, P. A. Dowben

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.

Original languageEnglish
Pages (from-to)L5-L8
JournalMaterials Science and Engineering B
Volume30
Issue number1
DOIs
Publication statusPublished - 1995 Feb
Externally publishedYes

Keywords

  • Aluminium
  • Chemical vapor deposition
  • TMAA: Photolysis

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Photo-assisted direct writing of conducting aluminum'. Together they form a unique fingerprint.

  • Cite this

    Hwang, S. D., Byun, D., Glass, J. A., Robertson, B., Spencer, J. T., Datta, S., & Dowben, P. A. (1995). Photo-assisted direct writing of conducting aluminum. Materials Science and Engineering B, 30(1), L5-L8. https://doi.org/10.1016/0921-5107(94)01140-0