Photo-assisted direct writing of conducting aluminum

Seong Don Hwang, Dongjin Byun, J. A. Glass, Brian Robertson, J. T. Spencer, S. Datta, P. A. Dowben

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)


We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.

Original languageEnglish
Pages (from-to)L5-L8
JournalMaterials Science and Engineering B
Issue number1
Publication statusPublished - 1995 Feb
Externally publishedYes


  • Aluminium
  • Chemical vapor deposition
  • TMAA: Photolysis

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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