Abstract
We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.
Original language | English |
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Pages (from-to) | L5-L8 |
Journal | Materials Science and Engineering B |
Volume | 30 |
Issue number | 1 |
DOIs | |
Publication status | Published - 1995 Feb |
Externally published | Yes |
Keywords
- Aluminium
- Chemical vapor deposition
- TMAA: Photolysis
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering