Photo-assisted direct writing of conducting aluminum

Seong Don Hwang; Dongjin Byun; J. A. Glass; Brian Robertson; J. T. Spencer; S. Datta; P. A. Dowben

doi:10.1016/0921-5107(94)01140-0

Photo-assisted direct writing of conducting aluminum

Seong Don Hwang, Dongjin Byun, J. A. Glass, Brian Robertson, J. T. Spencer, S. Datta, P. A. Dowben

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH₃(N(CH₃)₃)₂. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.

Original language	English
Pages (from-to)	L5-L8
Journal	Materials Science and Engineering B
Volume	30
Issue number	1
DOIs	https://doi.org/10.1016/0921-5107(94)01140-0
Publication status	Published - 1995 Feb
Externally published	Yes

Keywords

Aluminium
Chemical vapor deposition
TMAA: Photolysis

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Photo-assisted direct writing of conducting aluminum",

abstract = "We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.",

keywords = "Aluminium, Chemical vapor deposition, TMAA: Photolysis",

author = "Hwang, {Seong Don} and Dongjin Byun and Glass, {J. A.} and Brian Robertson and Spencer, {J. T.} and S. Datta and Dowben, {P. A.}",

note = "Funding Information: This work was funded by the Air Force Office of Science Research (AFOSR), the Research Institute of Industrial Science and Technology (Korea), International Business Machines through a joint study agreement, Leybold-Inficon, the W.M. Keck Center for Molecular Electronics and NSF through grant no. OSR-9255225. Copyright: Copyright 2014 Elsevier B.V., All rights reserved.",

year = "1995",

month = feb,

doi = "10.1016/0921-5107(94)01140-0",

language = "English",

volume = "30",

pages = "L5--L8",

journal = "Materials Science and Engineering B: Solid-State Materials for Advanced Technology",

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number = "1",

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TY - JOUR

T1 - Photo-assisted direct writing of conducting aluminum

AU - Hwang, Seong Don

AU - Byun, Dongjin

AU - Glass, J. A.

AU - Robertson, Brian

AU - Spencer, J. T.

AU - Datta, S.

AU - Dowben, P. A.

N1 - Funding Information: This work was funded by the Air Force Office of Science Research (AFOSR), the Research Institute of Industrial Science and Technology (Korea), International Business Machines through a joint study agreement, Leybold-Inficon, the W.M. Keck Center for Molecular Electronics and NSF through grant no. OSR-9255225. Copyright: Copyright 2014 Elsevier B.V., All rights reserved.

PY - 1995/2

Y1 - 1995/2

N2 - We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.

AB - We have succeeded in selective area deposition of aluminum films by ultraviolet photolytic decomposition of the organometallic complex trimethylamine alane, TMAA-AlH3(N(CH3)3)2. Both ultraviolet and visible light successfully photolysed the alane adduct and resulted in selective area deposition. The light sources exhibited different laser fragmentation mass spectra, suggesting somewhat different decomposition pathways.

KW - Aluminium

KW - Chemical vapor deposition

KW - TMAA: Photolysis

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DO - 10.1016/0921-5107(94)01140-0

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JF - Materials Science and Engineering B: Solid-State Materials for Advanced Technology

SN - 0921-5107

IS - 1

ER -

Photo-assisted direct writing of conducting aluminum

Abstract

Keywords

ASJC Scopus subject areas

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