TY - JOUR
T1 - Photo-Transformable Gratings for Augmented Reality
AU - Lim, Yongjun
AU - Kang, Byungsoo
AU - Lee, Seungwoo
N1 - Funding Information:
This work was mainly supported by Samsung Research Funding Center for Samsung Electronics under project number SRFC‐MA1801‐04. Y.L. and B.K. were supported by scholarship and funded, respectively, by Korea University and the KU‐KIST School Project.
Funding Information:
This work was mainly supported by Samsung Research Funding Center for Samsung Electronics under project number SRFC-MA1801-04. Y.L. and B.K. were supported by scholarship and funded, respectively, by Korea University and the KU-KIST School Project.
Publisher Copyright:
© 2021 Wiley-VCH GmbH.
PY - 2021/7/9
Y1 - 2021/7/9
N2 - The seamless integration of multiple diffractive optical elements (DOEs) into a single-level substrate has been the key for the advancements in augmented reality (AR) technologies. Presently, serial-type lithographic manipulations such as electron-beam lithography can successfully provide a deterministic route toward this end. The large-scale utilization of these processes, however, is impractical owing to their high cost. The holographic inscription of photochromic materials can offer an etching-free and wide-scale strategy for the cost-effective development of large-area 1D DOEs. Given the processing time, the accessible DOE area from this holographic inscription is more than several orders of magnitude larger (108–1010 µm2 h−1) than that obtained through the aforementioned lithography (102–105 µm2 h−1). However, erasing, which is believed to be prevalent in the multiscale integration of various DOEs, deteriorates the pattern integrity and throughput. Here, it is proposed that the technical conundrum resulting from erasing and re-inscribing the DOEs can be effectively circumvented by transforming the already formed DOEs without erasing. Centimeter-scale mosaic DOEs can be readily developed within an hour, which in turn facilitate advanced AR demonstrations. This approach leverages the ability of holographic inscription to seamlessly integrate the wide-scale multiple DOEs as well as their utility as a go-to tool for AR technologies.
AB - The seamless integration of multiple diffractive optical elements (DOEs) into a single-level substrate has been the key for the advancements in augmented reality (AR) technologies. Presently, serial-type lithographic manipulations such as electron-beam lithography can successfully provide a deterministic route toward this end. The large-scale utilization of these processes, however, is impractical owing to their high cost. The holographic inscription of photochromic materials can offer an etching-free and wide-scale strategy for the cost-effective development of large-area 1D DOEs. Given the processing time, the accessible DOE area from this holographic inscription is more than several orders of magnitude larger (108–1010 µm2 h−1) than that obtained through the aforementioned lithography (102–105 µm2 h−1). However, erasing, which is believed to be prevalent in the multiscale integration of various DOEs, deteriorates the pattern integrity and throughput. Here, it is proposed that the technical conundrum resulting from erasing and re-inscribing the DOEs can be effectively circumvented by transforming the already formed DOEs without erasing. Centimeter-scale mosaic DOEs can be readily developed within an hour, which in turn facilitate advanced AR demonstrations. This approach leverages the ability of holographic inscription to seamlessly integrate the wide-scale multiple DOEs as well as their utility as a go-to tool for AR technologies.
KW - augmented reality
KW - diffractive optical elements
KW - holographic fabrications
KW - mass migration
UR - http://www.scopus.com/inward/record.url?scp=85109373676&partnerID=8YFLogxK
U2 - 10.1002/adfm.202100839
DO - 10.1002/adfm.202100839
M3 - Article
AN - SCOPUS:85109373676
VL - 31
JO - Advanced Functional Materials
JF - Advanced Functional Materials
SN - 1616-301X
IS - 28
M1 - 2100839
ER -