Photocatalytic TiO2 deposition by chemical vapor deposition

Dong Jin Byun, Yongki Jin, Bumjoon Kim, Joong Kee Lee, Dalkeun Park

Research output: Contribution to journalArticle

123 Citations (Scopus)

Abstract

Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO2 films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO2 film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO2 thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO2 under UV exposure were characterized. As the TiO2 film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO2 thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO2 should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO2. Copyright (C) 2000 Elsevier Science B.V.

Original languageEnglish
Pages (from-to)199-206
Number of pages8
JournalJournal of Hazardous Materials
Volume73
Issue number2
DOIs
Publication statusPublished - 2000 Apr 3

Fingerprint

Chemical vapor deposition
Benzene
Glass
Thin films
Temperature
Annealing
Chemical Phenomena
preferred orientation
annealing
benzene
Crystallization
coating
Coatings
glass
Spin coating
Sodium
Titanium dioxide
Reaction rates
Ions
chemical

Keywords

  • CVD
  • Photocatalytic
  • Preferred orientation
  • TiO

ASJC Scopus subject areas

  • Chemical Health and Safety
  • Process Chemistry and Technology
  • Safety, Risk, Reliability and Quality
  • Environmental Engineering

Cite this

Photocatalytic TiO2 deposition by chemical vapor deposition. / Byun, Dong Jin; Jin, Yongki; Kim, Bumjoon; Kee Lee, Joong; Park, Dalkeun.

In: Journal of Hazardous Materials, Vol. 73, No. 2, 03.04.2000, p. 199-206.

Research output: Contribution to journalArticle

Byun, Dong Jin ; Jin, Yongki ; Kim, Bumjoon ; Kee Lee, Joong ; Park, Dalkeun. / Photocatalytic TiO2 deposition by chemical vapor deposition. In: Journal of Hazardous Materials. 2000 ; Vol. 73, No. 2. pp. 199-206.
@article{9ccceec2a68f4c1ba8da31c434f9962a,
title = "Photocatalytic TiO2 deposition by chemical vapor deposition",
abstract = "Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO2 films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO2 film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO2 thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO2 under UV exposure were characterized. As the TiO2 film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO2 thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO2 should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO2. Copyright (C) 2000 Elsevier Science B.V.",
keywords = "CVD, Photocatalytic, Preferred orientation, TiO",
author = "Byun, {Dong Jin} and Yongki Jin and Bumjoon Kim and {Kee Lee}, Joong and Dalkeun Park",
year = "2000",
month = "4",
day = "3",
doi = "10.1016/S0304-3894(99)00179-X",
language = "English",
volume = "73",
pages = "199--206",
journal = "Journal of Hazardous Materials",
issn = "0304-3894",
publisher = "Elsevier",
number = "2",

}

TY - JOUR

T1 - Photocatalytic TiO2 deposition by chemical vapor deposition

AU - Byun, Dong Jin

AU - Jin, Yongki

AU - Kim, Bumjoon

AU - Kee Lee, Joong

AU - Park, Dalkeun

PY - 2000/4/3

Y1 - 2000/4/3

N2 - Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO2 films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO2 film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO2 thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO2 under UV exposure were characterized. As the TiO2 film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO2 thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO2 should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO2. Copyright (C) 2000 Elsevier Science B.V.

AB - Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO2 films on window glass substrates. Post-annealing at high temperature required for other deposition methods causes sodium ion diffusion into TiO2 film from window glass, resulting in the degradation of photocatalytic efficiency. Anatase-structured TiO2 thin films were deposited on window glass by CVD, and the photocatalytic dissociation rates of benzene with CVD-grown TiO2 under UV exposure were characterized. As the TiO2 film deposition temperature was increased, the (112)-preferred orientations were observed in the film. The (112)-preferred orientation of TiO2 thin film resulted in a columnar structure with a larger surface area for benzene dissociation. Obviously, benzene dissociation rate was maximum when the degree of the (112) preferential orientation was maximum. It is clear that the thin film TiO2 should be controlled to exhibit the preferred orientation for the optimum photocatalytic reaction rate. CVD method is an alternative for the deposition of photocatalytic TiO2. Copyright (C) 2000 Elsevier Science B.V.

KW - CVD

KW - Photocatalytic

KW - Preferred orientation

KW - TiO

UR - http://www.scopus.com/inward/record.url?scp=0034599380&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034599380&partnerID=8YFLogxK

U2 - 10.1016/S0304-3894(99)00179-X

DO - 10.1016/S0304-3894(99)00179-X

M3 - Article

VL - 73

SP - 199

EP - 206

JO - Journal of Hazardous Materials

JF - Journal of Hazardous Materials

SN - 0304-3894

IS - 2

ER -