Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

Dong Hoon Choi, Sang Joon Oh

Research output: Contribution to journalArticle

22 Citations (Scopus)

Abstract

We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.

Original languageEnglish
Pages (from-to)1559-1564
Number of pages6
JournalEuropean Polymer Journal
Volume38
Issue number8
DOIs
Publication statusPublished - 2002 Aug

Keywords

  • Chalcone
  • Photocrosslink
  • Photopolymerization
  • Photosensitive
  • UV irradiation

ASJC Scopus subject areas

  • Physics and Astronomy(all)
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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