Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain

Dong Hoon Choi, Sang Joon Oh

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We synthesized the new photosensitive oligomer containing a chalcone moiety in the main chain by end-capping reaction of diepoxide compound with methacrylic acid. The chalcone-epoxy oligomeric compound was synthesized with 4,4(′)-dihydroxychalcone and epichlorohydrin. Investigation of the photosensitivity of the newly synthesized chalcone oligomer was carried out by using UV-Vis absorption and infrared spectroscopies under UV exposure. We observed the photodimerization behavior under UV irradiation. At the same time, we could also observe the photopolymerization of the compound with a trace amount of dimethoxyphenyl acetophenone. Thermal properties of UV-cured dimethacrylate compounds were also studied.

Original languageEnglish
Pages (from-to)1559-1564
Number of pages6
JournalEuropean Polymer Journal
Volume38
Issue number8
DOIs
Publication statusPublished - 2002 Aug 1
Externally publishedYes

Fingerprint

Chalcone
Photochemical reactions
oligomers
Oligomers
photochemical reactions
Photosensitivity
Photopolymerization
epoxy compounds
photosensitivity
Ultraviolet spectroscopy
Epichlorohydrin
Absorption spectroscopy
Infrared spectroscopy
absorption spectroscopy
Thermodynamic properties
thermodynamic properties
infrared spectroscopy
Irradiation
acids
irradiation

Keywords

  • Chalcone
  • Photocrosslink
  • Photopolymerization
  • Photosensitive
  • UV irradiation

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics

Cite this

Photochemical reactions of a dimethacrylate compound containing a chalcone moiety in the main chain. / Choi, Dong Hoon; Oh, Sang Joon.

In: European Polymer Journal, Vol. 38, No. 8, 01.08.2002, p. 1559-1564.

Research output: Contribution to journalArticle

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