Photopatterned Polydiacetylene Images Using a DNA Bio-Photomask

Yun Kyung Jung, Cheulhee Jung, Hyun Gyu Park

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

We describe a novel strategy to fabricate a well-defined polydiacetylene (PDA) supramolecular pattern on polyvinylidene fluoride (PVDF) membrane utilizing a DNA bio-photomask. By focusing on that, the absorption spectrum of DNA molecules having a λmax at 260 nm overlaps with the wavelength at which the photopolymerization of the diacetylene monomer occurs, DNA molecules are used to define specific patterns on PVDF membranes coated with diacetylene lipids by shielding the applied 254 nm UV light and consequently preventing the photopolymerization of the lipids. As a result, the DNA-covered regions retain the original white color on the membrane while the regions uncovered by DNA molecules undergo the color change to blue through the photopolymerization by 254 nm UV irradiation. On the basis of the selective illumination through a DNA photomask, we precisely manufacture specific patterns using a microarray spotting method and also demonstrate the capability of this strategy to achieve a novel colorimetric DNA sensor without any complicated process.

Original languageEnglish
Pages (from-to)15684-15690
Number of pages7
JournalACS Applied Materials and Interfaces
Volume8
Issue number24
DOIs
Publication statusPublished - 2016 Jun 22
Externally publishedYes

Keywords

  • bio-photomask
  • DNA
  • photopatterning
  • polydiacetylene (PDA)
  • PVDF membrane

ASJC Scopus subject areas

  • Materials Science(all)

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